SCHEMBL8550826

SCHEMBL8550826

O=[N+]([O-])c1ccccc1CN1CCC(O)CC1

nearest known ligand 0.74

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ACHE P22303 1/20 0.74
ALDH1A1 P00352 7/20 0.58
KDM4E B2RXH2 6/20 0.58
POLB P06746 2/20 0.58
MEN1 O00255 1/20 0.58
KMT2A Q03164 1/20 0.58
LMNA P02545 4/20 0.56
SIGMAR1 Q99720 1/20 0.56
HTT P42858 1/20 0.56
SMN1; SMN2 Q16637 1/20 0.53
TDP1 Q9NUW8 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12511057 0.86 ACHE (0.74) ACHEALDH1A1KDM4EPOLBMEN1
SCHEMBL9911772 0.85 ACHE (0.74) ACHEALDH1A1KDM4EPOLBMEN1
SCHEMBL2372693 0.83 ACHE (0.70) ACHEALDH1A1KDM4EPOLBMEN1
SCHEMBL14351628 0.81 ACHE (0.68) ACHEALDH1A1KDM4EPOLBMEN1
SCHEMBL4201011 0.81 SIGMAR1 (0.71) ACHEALDH1A1KDM4EPOLBMEN1
SCHEMBL19175108 0.81 KDM4E (0.55) ACHEALDH1A1KDM4EPOLBLMNA
SCHEMBL27397886 0.80 ACHE (0.67) ACHEALDH1A1KDM4EPOLBMEN1
SCHEMBL9621558 0.79 ACHE (0.65) ACHEALDH1A1KDM4EPOLBMEN1
SCHEMBL4586698 0.79 ACHE (0.69) ACHEALDH1A1KDM4EPOLBMEN1
SCHEMBL9008678 0.79 ACHE (0.65) ACHEALDH1A1KDM4EPOLBMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115262212-A Cotton fabric crease-resistant antibacterial finishing method based on organic silicon resin 江苏自然风纺织品有限公司 2022-11-01 CN claimed
CN-122085594-A Positive coloring photosensitive composition and application thereof 2026-05-26 CN disclosed
WO-2023171733-A1 WAFER EDGE PROTECTIVE FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MANUFACTURING 日産化学株式会社 2023-09-14 WO disclosed
WO-2023162968-A1 PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKING POLYMER 日産化学株式会社 2023-08-31 WO disclosed
WO-2023085414-A1 POLYCYCLIC AROMATIC HYDROCARBON-BASED PHOTO-CURABLE RESIN COMPOSITION 日産化学株式会社 2023-05-19 WO disclosed
WO-2023033094-A1 WAFER EDGE PROTECTIVE-FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MANUFACTURING 日産化学株式会社 2023-03-09 WO disclosed
CN-115262212-A Cotton fabric crease-resistant antibacterial finishing method based on organic silicon resin 江苏自然风纺织品有限公司 2022-11-01 CN disclosed
CN-1084329-C Benzyl piepridine derivs as pharmaceutical agents HOFFMANN LA ROCHE (CH) 2002-05-08 CN disclosed
EP-0871613-A1 BENZYL PIPERIDINE DERIVATIVES AS PHARMACEUTICAL AGENTS F. HOFFMANN-LA ROCHE AG (CH) 1998-10-21 EP disclosed
CN-1183768-A Benzyl piepridine derivs as pharmaceutical agents HOFFMANN LA ROCHE (CH) 1998-06-03 CN disclosed
US-5753679-A SCIZOPHRENIA HOFFMANN-LA ROCHE INC. (US) 1998-05-19 US disclosed
WO-1996035666-A1 BENZYL PIPERIDINE DERIVATIVES AS PHARMACEUTICAL AGENTS F.HOFFMANN-LA ROCHE AG (CH) 1996-11-14 WO disclosed