SCHEMBL8550844

SCHEMBL8550844

CC(=CCCNC(=O)Nc1ccc(C)cc1)C(=O)O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.53
CASR P41180 1/20 0.53
CYP1A2 P05177 1/20 0.53
CYP3A4 P08684 1/20 0.53
CYP2C9 P11712 1/20 0.53
CYP2C19 P33261 1/20 0.53
NPC1 O15118 5/20 0.51
CNR1 P21554 3/20 0.50
RAB9A P51151 4/20 0.48
SMN1; SMN2 Q16637 4/20 0.48
TP53 P04637 2/20 0.48
MEN1 O00255 1/20 0.48
HPGD P15428 1/20 0.48
KMT2A Q03164 1/20 0.48
SLC6A3 Q01959 1/20 0.47
CA12 O43570 1/20 0.47
CA1 P00915 1/20 0.47
CA2 P00918 1/20 0.47
CA4 P22748 1/20 0.47
CA7 P43166 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8550837 1.00 ALDH1A1 (0.53) ALDH1A1CASRCYP1A2CYP3A4CYP2C9
SCHEMBL4942266 0.89 MAOA (0.46) ALDH1A1CASRCYP1A2CYP3A4CYP2C9
SCHEMBL5670853 0.89 MAOA (0.46) ALDH1A1CASRCYP1A2CYP3A4CYP2C9
SCHEMBL8549835 0.88 EPHX1 (0.54) ALDH1A1CASRCYP1A2CYP3A4CYP2C9
SCHEMBL8549827 0.88 EPHX1 (0.54) ALDH1A1CASRCYP1A2CYP3A4CYP2C9
SCHEMBL8550251 0.87 NAMPT (0.47) ALDH1A1CASRCYP1A2CYP3A4CYP2C9
SCHEMBL8550248 0.87 NAMPT (0.47) ALDH1A1CASRCYP1A2CYP3A4CYP2C9
SCHEMBL31122213 0.87 CNR1 (0.44) ALDH1A1CASRCYP1A2CYP3A4CYP2C9
SCHEMBL15914263 0.85 CNR1 (0.53) ALDH1A1CNR1RAB9ASMN1; SMN2MEN1
SCHEMBL8549988 0.85 CNR1 (0.43) ALDH1A1CASRCYP1A2CYP3A4CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5731127-A WEAR RESISTANCE, SOLVENT RESISTANCE DAINIPPON INK AND CHEMICALS, INC. (JP) 1998-03-24 US disclosed
EP-0737896-A2 Photosensitive composition and photosensitive planographic printing plate DAINIPPON INK AND CHEMICALS, INC. (JP) 1996-10-16 EP disclosed