SCHEMBL85644

SCHEMBL85644

C=C(C)C(=O)OC(CC(O)(C(F)(F)F)C(F)(F)F)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.32

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.32
NPC1 O15118 1/20 0.31
EPHX2 P34913 2/20 0.31
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15836468 0.88 ALDH1A1 (0.31) ALDH1A1NPC1EPHX2MEN1KMT2A
SCHEMBL21122438 0.78 ALDH1A1 (0.39) ALDH1A1NPC1EPHX2MEN1KMT2A
SCHEMBL74905 0.78 ALDH1A1 (0.33) ALDH1A1NPC1MEN1KMT2A
SCHEMBL9610661 0.77 NPC1 (0.32) ALDH1A1NPC1
SCHEMBL85908 0.76
SCHEMBL13006208 0.75 TSHR (0.36) ALDH1A1
SCHEMBL15836473 0.74 ALDH1A1 (0.37) ALDH1A1NPC1EPHX2MEN1KMT2A
SCHEMBL75248 0.73 TSHR (0.39) ALDH1A1
SCHEMBL25780531 0.72 TSHR (0.34) ALDH1A1
SCHEMBL13467556 0.72 TSHR (0.34) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9201300-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-01 US disclosed
US-20140178818-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-26 US disclosed
US-8129099-B2 Double patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-06 US disclosed
US-20090208886-A1 DOUBLE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-20 US disclosed