⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15836492 | 0.89 | — | — | |
| SCHEMBL85892 | 0.81 | LMNA (0.32) | — | |
| SCHEMBL3415846 | 0.79 | ALDH1A1 (0.33) | — | |
| SCHEMBL12002690 | 0.79 | ALDH1A1 (0.33) | — | |
| SCHEMBL86335 | 0.77 | PDK1 (0.31) | — | |
| SCHEMBL17072633 | 0.77 | — | — | |
| SCHEMBL18020327 | 0.77 | — | — | |
| SCHEMBL2117228 | 0.77 | HSD11B1 (0.35) | — | |
| SCHEMBL85644 | 0.76 | ALDH1A1 (0.32) | — | |
| SCHEMBL17070854 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9201300-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-01 | — | — | US | disclosed |
| US-20140178818-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-26 | — | — | US | disclosed |
| US-8129099-B2 | Double patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-06 | — | — | US | disclosed |
| US-20090208886-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |