SCHEMBL85826

SCHEMBL85826

COc1c(C)c(C)c(C)c(C)c1C

nearest known ligand 0.42

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ACHE P22303 1/20 0.38
KDM4E B2RXH2 1/20 0.35
ALDH1A1 P00352 1/20 0.35
MAPK1 P28482 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
TDP1 Q9NUW8 1/20 0.32
CYP3A4 P08684 2/20 0.30
MAPT P10636 1/20 0.30
CA9 Q16790 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2952712 0.96 ACHE (0.40) ACHEKDM4EALDH1A1MAPK1SMN1; SMN2
SCHEMBL12974023 0.89 ACHE (0.33) ACHEKDM4EALDH1A1MAPK1SMN1; SMN2
SCHEMBL2495732 0.88 ACHE (0.36) ACHEKDM4EALDH1A1MAPK1SMN1; SMN2
SCHEMBL2494937 0.88 ACHE (0.36) ACHEKDM4EALDH1A1MAPK1SMN1; SMN2
SCHEMBL11308950 0.87 ACHE (0.40) ACHEKDM4EALDH1A1MAPK1SMN1; SMN2
SCHEMBL8915846 0.85 ACHE (0.35) ACHEKDM4EALDH1A1MAPK1SMN1; SMN2
SCHEMBL14217694 0.83 ACHE (0.38) ACHEKDM4EALDH1A1MAPK1SMN1; SMN2
SCHEMBL12445005 0.82
SCHEMBL9282311 0.79 ACHE (0.32) ACHE
SCHEMBL11268433 0.79 CA2 (0.40) ACHEALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 518 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8426115-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-23 US claimed
US-20110033803-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-02-10 US claimed
US-20100159392-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-24 US claimed
US-20240026073-A1 RESIN COMPOSITION AND MOLDED ARTICLE MITSUBISHI CHEMICAL CORPORATION (JP) 2024-01-25 US disclosed
US-20230382065-A1 METHOD FOR MAKING EMBEDDED HYDROGEL CONTACT LENSES ALCON INC. (CH) 2023-11-30 US disclosed
US-20230374300-A1 RESIN COMPOSITION, MOLDED ARTICLE, AND METHOD FOR MANUFACTURING PLATED MOLDED ARTICLE MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 2023-11-23 US disclosed
US-20230357478-A1 METHOD FOR MAKING EMBEDDED HYDROGEL CONTACT LENSES ALCON INC. (CH) 2023-11-09 US disclosed
US-11802184-B2 Process and apparatus for precipitation of poly (phenylene ether) SHPP GLOBAL TECHNOLOGIES B.V. (NL) 2023-10-31 US disclosed
US-20230340252-A1 RESIN COMPOSITION AND ELECTROMAGNETIC WAVE ABSORBER MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 2023-10-26 US disclosed
US-20230339148-A1 METHOD FOR MAKING EMBEDDED HYDROGEL CONTACT LENSES ALCON INC. (CH) 2023-10-26 US disclosed
US-20230339149-A1 METHOD FOR MAKING EMBEDDED HYDROGEL CONTACT LENSES ALCON INC. (CH) 2023-10-26 US disclosed
CN-1227213-C Process for preparing cyclopropane carboxylic acid ester SUMITOMO CHEMICAL CO (JP) 2005-11-16 CN disclosed
CN-1660764-A Process for the preparation of carboxylic acid esters SUMITOMO CHEMICAL CO (JP) 2005-08-31 CN disclosed
CN-1210248-C Process for prepn. of cyclopropane formic ether SUMITOMO CHEMICAL CO (JP) 2005-07-13 CN disclosed
CN-1183095-C Preparation method of cyclopropane carboxylic acid ester 住友化学工业株式会社 2005-01-05 CN disclosed
CN-1144778-C Method for preparing cyclopropane carboxylic ester 住友化学工业株式会社 2004-04-07 CN disclosed
CN-1369476-A Process for prepn. of cyclopropane formic ether SUMITOMO CHEMICAL CO (JP) 2002-09-18 CN disclosed
CN-1354166-A Process for preparing cyclopropane carboxylic acid ester SUMITOMO CHEMICAL CO (JP) 2002-06-19 CN disclosed
CN-1282729-A Preparation method of cyclopropane carboxylic acid ester SUMITOMO CHEMICAL CO (JP) 2001-02-07 CN disclosed
CN-1255489-A Method for preparing cyclopropane carboxylic ester SUMITOMO CHEM ENG (JP) 2000-06-07 CN disclosed