SCHEMBL8587205

SCHEMBL8587205

C=C(C)C(=O)OC(C)(C)C.C=Cc1ccc(OC(C)OCC)cc1

nearest known ligand 0.36

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CHRNB2 P17787 1/20 0.33
CHRNB4 P30926 1/20 0.33
CHRNA3 P32297 1/20 0.33
CHRNA7 P36544 1/20 0.33
CHRNA4 P43681 1/20 0.33
HIF1A Q16665 2/20 0.32
EPAS1 Q99814 2/20 0.32
TAS1R3 Q7RTX0 2/20 0.32
TAS1R1 Q7RTX1 2/20 0.32
BCHE P06276 1/20 0.30
ACHE P22303 1/20 0.30
PTGS2 P35354 1/20 0.30
POLB P06746 1/20 0.30
ALDH1A3 P47895 1/20 0.30
PPARG P37231 1/20 0.30
PPARD Q03181 1/20 0.30
PPARA Q07869 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
4-Vinylphenol SCHEMBL8094476 0.92 NR1H4 (0.33) PPARGPPARDPPARA
SCHEMBL7617965 0.87 TAS1R3 (0.39) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL3837576 0.86 STAT3 (0.37) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
4-Vinylphenol SCHEMBL7936921 0.83
4-Vinylphenol SCHEMBL29130680 0.82 CA12 (0.35) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
4-Vinylphenol SCHEMBL7702861 0.81 ELANE (0.41) HIF1AEPAS1BCHEPPARGPPARA
4-Vinylphenol SCHEMBL6906320 0.81 ESR1 (0.38) TAS1R3TAS1R1
SCHEMBL134315 0.81 CHRNB2 (0.42) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
4-Vinylphenol SCHEMBL6555198 0.79 NR1H4 (0.35) HIF1ATAS1R3TAS1R1PPARGPPARD
SCHEMBL5702566 0.79 LTB4R (0.37) PPARA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0520642-B1 Resist material and pattern formation process WAKO PURE CHEM IND LTD (JP) 1998-10-28 EP disclosed
US-5468589-A Heat resistant, photosensitive patterns WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1995-11-21 US disclosed
EP-0588544-A2 Fine pattern forming material and pattern formation process WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1994-03-23 EP disclosed
EP-0520642-A1 Resist material and pattern formation process WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1992-12-30 EP disclosed