Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL86322 | 0.83 | TSHR (0.32) | TSHR | |
| SCHEMBL15000216 | 0.82 | TSHR (0.39) | TSHRALDH1A1 | |
| SCHEMBL75248 | 0.82 | TSHR (0.39) | TSHRALDH1A1 | |
| SCHEMBL2297278 | 0.82 | TSHR (0.31) | TSHR | |
| SCHEMBL9610671 | 0.81 | TSHR (0.38) | TSHRALDH1A1 | |
| SCHEMBL25561465 | 0.80 | TSHR (0.40) | TSHRALDH1A1 | |
| SCHEMBL6849319 | 0.80 | TSHR (0.42) | TSHRALDH1A1 | |
| SCHEMBL15839382 | 0.79 | TSHR (0.37) | TSHRALDH1A1 | |
| SCHEMBL13515124 | 0.79 | TSHR (0.39) | TSHRALDH1A1 | |
| SCHEMBL14865702 | 0.79 | TSHR (0.39) | TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9201300-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-01 | — | — | US | disclosed |
| US-20140178818-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-26 | — | — | US | disclosed |
| US-8323872-B2 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-12-04 | — | — | US | disclosed |
| US-8129099-B2 | Double patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-06 | — | — | US | disclosed |
| US-20090208886-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20070003867-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-04 | — | — | US | disclosed |