SCHEMBL8596338

SCHEMBL8596338

CC[Si](C)(C)N(C)[Si](C)(C)N(C)[SiH2]C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22200158 0.73
SCHEMBL8711013 0.70 ALDH1A1 (0.32)
SCHEMBL8599934 0.70 ALDH1A1 (0.32)
SCHEMBL17721697 0.68
SCHEMBL1428307 0.68
SCHEMBL9358790 0.65
SCHEMBL972471 0.63
SCHEMBL5084776 0.62
SCHEMBL6273786 0.60
SCHEMBL4754657 0.59 ALDH1A1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0654544-B1 Process for lining a chemical reactor with silicon-based ceramic materials by thermal decomposition of silazane precursors ENICHEM SPA (IT) 1998-01-28 EP claimed
EP-0671483-B1 Method for vapor deposition of a ceramic coating using a steam-containing carrier gas and non-alkoxy silane precursors ENICHEM SPA (IT) 1997-12-29 EP claimed