SCHEMBL8711013

SCHEMBL8711013

C[SiH2]N(C)[Si](C)(C)N(C)[Si](C)(Cl)Cl

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8599934 0.84 ALDH1A1 (0.32) ALDH1A1
SCHEMBL17721697 0.71
SCHEMBL8596338 0.70
SCHEMBL9788988 0.69 ALDH1A1 (0.42) ALDH1A1
SCHEMBL2709128 0.64 ALDH1A1 (0.36) ALDH1A1
SCHEMBL22287352 0.64 ALDH1A1 (0.36) ALDH1A1
SCHEMBL6273786 0.64
SCHEMBL8595593 0.62
SCHEMBL27876709 0.61
Charcoal, Activated SCHEMBL8413635 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5723259-A Negative type composition for chemically amplified resist and process and apparatus of formation of chemically amplified resist pattern FUJITSU LIMITED (JP) 1998-03-03 US disclosed
US-5693145-A Apparatus of formation of chemically amplified resist pattern FUJITSU LIMITED (JP) 1997-12-02 US disclosed
EP-0551105-A2 Negative type composition for chemically amplified resist and process and apparatus of chemically amplified resist pattern FUJITSU LIMITED (JP) 1993-07-14 EP disclosed