Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9151190 | 0.61 | — | — | |
| Sulfuric Acid SCHEMBL28579626 | 0.49 | CA5A (0.50) | — | |
| Sulfuric Acid SCHEMBL20597917 | 0.48 | CA5A (0.86) | — | |
| Sulfuric Acid SCHEMBL10408975 | 0.48 | CA5A (0.86) | — | |
| Sulfuric Acid SCHEMBL820270 | 0.48 | — | — | |
| SCHEMBL150334 | 0.47 | LMNA (0.77) | — | |
| Sulfuric Acid SCHEMBL23397441 | 0.45 | CA5A (0.75) | — | |
| Sulfuric Acid SCHEMBL21815639 | 0.45 | — | — | |
| Sulfuric Acid SCHEMBL4021723 | 0.45 | CA5A (0.75) | — | |
| Sulfuric Acid SCHEMBL20896933 | 0.45 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-59231536-A | — | — | None | — | — | JP | disclosed |
| CN-110799190-B | Heterocyclic compounds | 卡都瑞恩医药有限公司 | 2024-04-19 | — | — | CN | disclosed |
| CN-117243839-A | Minoxidil adjuvant therapy | 应用生物学股份有限公司 | 2023-12-19 | — | — | CN | disclosed |
| EP-0517245-B1 | Developer for light-sensitive material | DAINIPPON INK & CHEMICALS (JP) | 1998-02-11 | — | — | EP | disclosed |
| US-5320928-A | Lithographic printing plates | FUJI PHOTO FILM CO., LTD. (JP) | 1994-06-14 | — | — | US | disclosed |
| US-5275915-A | Alkali metal compounds with anionic surfactant and antifoggant for silver halide photographic films | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1994-01-04 | — | — | US | disclosed |
| US-5272035-A | Photosensitive lithographic printing plate having treated aluminum support with diazonium light-sensitive layer containing polyurethane resin and phosphorous additive | FUJI PHOTO FILM CO., LTD. (JP) | 1993-12-21 | — | — | US | disclosed |
| EP-0517245-A1 | Developer for light-sensitive material | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1992-12-09 | — | — | EP | disclosed |
| EP-0331171-B1 | LIGHT-SENSITIVE COMPOSITION | FUJI PHOTO FILM CO., LTD. (JP) | 1992-09-16 | — | — | EP | disclosed |
| US-4980263-A | For lithographic printing plates | FUJI PHOTO FILM CO., LTD. (JP) | 1990-12-25 | — | — | US | disclosed |
| US-4929533-A | Using light sensitive diazo resin and high molecular weight copolymer | FUJI PHOTO FILM CO., LTD. (JP) | 1990-05-29 | — | — | US | disclosed |
| US-4917988-A | DISSOLVING IN 1-METHOXY-2-PROPANOL. METHYL LACTATE AND AN AMINO GROUP-FREE POLAR SOLVENT | FUJI PHOTO FILM CO., LTD. (JP) | 1990-04-17 | — | — | US | disclosed |
| EP-0127893-B1 | LIGHT-SENSITIVE COMPOSITION FOR USE WITH LITHOGRAPHIC PRINTING PLATES | FUJI PHOTO FILM CO., LTD. (JP) | 1990-03-14 | — | — | EP | disclosed |
| EP-0331171-A2 | Light-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1989-09-06 | — | — | EP | disclosed |
| US-4774161-A | LITHOGRAPHY, PRINTING PLATES | FUJI PHOTO FILM CO., LTD. (JP) | 1988-09-27 | — | — | US | disclosed |
| US-4617250-A | DIAZO RESIN, HIGH MOLECULAR WEIGHT ACID-CONTAINING COMPOUND, AROMATIC SULFONATE, AND ORGANIC DYE | FUJI PHOTO FILM CO., LTD. (JP) | 1986-10-14 | — | — | US | disclosed |
| JP-S59231536-A | DEVELOPING SOLUTION COMPOSITION | FUJI PHOTO FILM CO LTD | 1984-12-26 | — | — | JP | disclosed |
| EP-0127893-A2 | Light-sensitive composition for use with lithographic printing plates | FUJI PHOTO FILM CO., LTD. (JP) | 1984-12-12 | — | — | EP | disclosed |