⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8607270 | 0.95 | — | — | |
| SCHEMBL8606359 | 0.86 | — | — | |
| SCHEMBL10582264 | 0.82 | LMNA (0.32) | — | |
| SCHEMBL8608222 | 0.82 | — | — | |
| SCHEMBL8605497 | 0.78 | MEN1 (0.34) | — | |
| SCHEMBL11797450 | 0.73 | ALDH1A1 (0.35) | — | |
| SCHEMBL8971568 | 0.71 | ALDH1A1 (0.43) | — | |
| SCHEMBL10955280 | 0.70 | — | — | |
| SCHEMBL14174105 | 0.69 | CYP3A4 (0.34) | — | |
| SCHEMBL9202653 | 0.69 | ALDH1A1 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0441524-B1 | Photocrosslinkable photoinsolubilizable coating composition containing halomethyl-1,3,5-triazine moieties | MINNESOTA MINING & MFG (US) | 1998-10-07 | — | — | EP | disclosed |
| US-5723513-A | PHOTOCROSSLINKABLE, PHOTOINSOLUBILIZING COATING; PHOTOINITIATORS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1998-03-03 | — | — | US | disclosed |
| US-5496504-A | FREE RADICAL OR IONIC CHAIN POLYMERIZABLE; PHOTOINITIATORS; COPYING, IMAGING; RADIATION SENSITIVE | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-03-05 | — | — | US | disclosed |
| EP-0359430-B1 | Halomethyl-1,3,5-triazines containing a monomeric moiety | MINNESOTA MINING & MFG (US) | 1995-05-10 | — | — | EP | disclosed |
| US-5387682-A | A photoinitiators, a polytriazines chemical intermediates; photosensitivity, photopolymerizable | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1995-02-07 | — | — | US | disclosed |
| EP-0305115-B1 | IMPROVEMENTS IN OR RELATING TO RADIATION SENSITIVE COMPOUNDS | E.I. du Pont de Nemours and Company (US) | 1992-03-18 | — | — | EP | disclosed |
| EP-0441524-A2 | Polymers containing halomethyl-1,3,5-triazine moieties | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1991-08-14 | — | — | EP | disclosed |
| US-4933452-A | Radiation sensitive isocyanurate compounds | AGFA-GEVAERT. N.V. (BE) | 1990-06-12 | — | — | US | disclosed |
| EP-0359430-A2 | Halomethyl-1,3,5-triazines containing a monomeric moiety | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1990-03-21 | — | — | EP | disclosed |
| EP-0305115-A2 | Improvements in or relating to radiation sensitive compounds | E.I. du Pont de Nemours and Company (US) | 1989-03-01 | — | — | EP | disclosed |