⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8607270 | 0.86 | — | — | |
| SCHEMBL8607397 | 0.86 | — | — | |
| SCHEMBL14174105 | 0.80 | CYP3A4 (0.34) | — | |
| SCHEMBL8608222 | 0.77 | — | — | |
| SCHEMBL10582264 | 0.77 | LMNA (0.32) | — | |
| SCHEMBL80986 | 0.72 | KDM4E (0.33) | — | |
| SCHEMBL1976536 | 0.72 | KDM4E (0.33) | — | |
| SCHEMBL8605497 | 0.70 | MEN1 (0.34) | — | |
| SCHEMBL8605203 | 0.69 | CLK4 (0.36) | — | |
| SCHEMBL13026224 | 0.68 | GAA (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9663690-B2 | UV-curable silicone release compositions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2017-05-30 | — | — | US | disclosed |
| EP-2917298-A1 | UV-CURABLE SILICONE ADHESIVE COMPOSITIONS | 3M Innovative Properties Company (US) | 2015-09-16 | — | — | EP | disclosed |
| EP-2917295-A1 | UV-CURABLE SILICONE RELEASE COMPOSITIONS | 3M Innovative Properties Company (US) | 2015-09-16 | — | — | EP | disclosed |
| US-20150252235-A1 | UV-CURABLE SILICONE ADHESIVE COMPOSITIONS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2015-09-10 | — | — | US | disclosed |
| US-20150247078-A1 | UV-CURABLE SILICONE RELEASE COMPOSITIONS | 3M INNOVATIVE PROPERTIES COMPANY | 2015-09-03 | — | — | US | disclosed |
| WO-2014074336-A1 | UV-CURABLE SILICONE ADHESIVE COMPOSITIONS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2014-05-15 | — | — | WO | disclosed |
| WO-2014074372-A1 | UV-CURABLE SILICONE RELEASE COMPOSITIONS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2014-05-15 | — | — | WO | disclosed |
| US-5723513-A | PHOTOCROSSLINKABLE, PHOTOINSOLUBILIZING COATING; PHOTOINITIATORS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1998-03-03 | — | — | US | disclosed |
| EP-0361682-B1 | Halomethyl-1,3,5-triazines containing a photoinitiator moiety | MINNESOTA MINING & MFG (US) | 1996-03-27 | — | — | EP | disclosed |
| US-5496504-A | FREE RADICAL OR IONIC CHAIN POLYMERIZABLE; PHOTOINITIATORS; COPYING, IMAGING; RADIATION SENSITIVE | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-03-05 | — | — | US | disclosed |
| EP-0305115-B1 | IMPROVEMENTS IN OR RELATING TO RADIATION SENSITIVE COMPOUNDS | E.I. du Pont de Nemours and Company (US) | 1992-03-18 | — | — | EP | disclosed |
| EP-0441524-A2 | Polymers containing halomethyl-1,3,5-triazine moieties | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1991-08-14 | — | — | EP | disclosed |
| US-5034526-A | Photoinitiators for duplication, copies and images | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1991-07-23 | — | — | US | disclosed |
| US-4985562-A | PHOTOINITIATORES, PHOTORESISTS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1991-01-15 | — | — | US | disclosed |
| US-4933452-A | Radiation sensitive isocyanurate compounds | AGFA-GEVAERT. N.V. (BE) | 1990-06-12 | — | — | US | disclosed |
| EP-0361682-A1 | Halomethyl-1,3,5-triazines containing a photoinitiator moiety | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1990-04-04 | — | — | EP | disclosed |
| EP-0360434-A2 | Halomethyl-1,3,5-triazines containing an amine-containing moiety | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1990-03-28 | — | — | EP | disclosed |
| EP-0359431-A2 | Halomethyl-1,3,5-triazines containing a sensitizer moiety | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1990-03-21 | — | — | EP | disclosed |
| EP-0359430-A2 | Halomethyl-1,3,5-triazines containing a monomeric moiety | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1990-03-21 | — | — | EP | disclosed |
| EP-0305115-A2 | Improvements in or relating to radiation sensitive compounds | E.I. du Pont de Nemours and Company (US) | 1989-03-01 | — | — | EP | disclosed |