Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.38 |
| ▸ | GRIN2D | O15399 | 4/20 | 0.35 |
| ▸ | GRIN3B | O60391 | 4/20 | 0.35 |
| ▸ | GRIN1 | Q05586 | 4/20 | 0.35 |
| ▸ | GRIN2A | Q12879 | 4/20 | 0.35 |
| ▸ | GRIN2B | Q13224 | 4/20 | 0.35 |
| ▸ | GRIN2C | Q14957 | 4/20 | 0.35 |
| ▸ | GRIN3A | Q8TCU5 | 4/20 | 0.35 |
| ▸ | LMNA | P02545 | 4/20 | 0.33 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.33 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.33 |
| ▸ | STAT6 | P42226 | 1/20 | 0.33 |
| ▸ | SLC47A1 | Q96FL8 | 1/20 | 0.33 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4340777 | 0.80 | NPSR1 (0.47) | NPSR1LMNATSHRALDH1A1MEN1 | |
| SCHEMBL4253114 | 0.79 | — | — | |
| SCHEMBL13998863 | 0.77 | PKM (0.42) | ALDH1A1RAB9A | |
| SCHEMBL2546505 | 0.74 | NPSR1 (0.43) | NPSR1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL2546508 | 0.74 | NPSR1 (0.38) | NPSR1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL18643624 | 0.74 | NPSR1 (0.38) | NPSR1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL270387 | 0.74 | NPSR1 (0.43) | NPSR1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL386960 | 0.74 | NPSR1 (0.38) | NPSR1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL4807262 | 0.73 | NPSR1 (0.31) | NPSR1ALDH1A1MEN1HTTKMT2A | |
| SCHEMBL13980107 | 0.73 | GRIN2D (0.31) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080318156-A1 | Adamantane Based Molecular Glass Photoresists for Sub-200 Nm Lithography | CORNELL RESEARCH FOUNDATION, INC. | 2008-12-25 | — | — | US | claimed |
| EP-1991910-A1 | ADAMANTANE BASED MOLECULAR GLASS PHOTORESISTS FOR SUB-200 NM LITHOGRAPHY | Cornell Research Foundation, Inc. (US) | 2008-11-19 | — | — | EP | claimed |
| WO-2007094784-A1 | ADAMANTANE BASED MOLECULAR GLASS PHOTORESISTS FOR SUB-200 NM LITHOGRAPHY | CORNELL RESEARCH FOUNDATION, INC. (US) | 2007-08-23 | — | — | WO | claimed |
| US-8889333-B2 | Salt, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-11-18 | — | — | US | disclosed |
| US-8889333-B2 | Salt, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-11-18 | — | — | US | disclosed |
| EP-2433972-B1 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2014-11-12 | — | — | EP | disclosed |
| EP-1717261-B1 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2014-01-01 | — | — | EP | disclosed |
| US-8574809-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-20120264060-A1 | SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-18 | — | — | US | disclosed |
| US-20120264060-A1 | SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-18 | — | — | US | disclosed |
| EP-2433972-A1 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2012-03-28 | — | — | EP | disclosed |
| EP-1602976-B1 | Resist material and pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2007-01-17 | — | — | EP | disclosed |
| EP-1717261-A1 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-11-02 | — | — | EP | disclosed |
| US-20050277057-A1 | Resist material and pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-12-15 | — | — | US | disclosed |
| EP-1602976-A1 | Resist material and pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-12-07 | — | — | EP | disclosed |
| US-20050266338-A1 | Resist material and pattern formation method | PANASONIC CORPORATION (JP) | 2005-12-01 | — | — | US | disclosed |
| US-20050266337-A1 | Resist material and pattern formation method | PANNOVA SEMIC, LLC | 2005-12-01 | — | — | US | disclosed |
| EP-1517181-A1 | Sulfonamide compound, polymer compound, reist material and pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-03-23 | — | — | EP | disclosed |
| US-20050058935-A1 | Sulfonamide compound, polymer compound, resist material and pattern formation method | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2005-03-17 | — | — | US | disclosed |
| US-6270942-B1 | PHOTOSENSITVE POLYMER CONTAINING NORBORNENE UNITS, MALEIC ANHYDRIDE UNITS AND UNSATURATED ESTER | SAMSUNG ELECTRONICS CO., LTD (KR) | 2001-08-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120264060-A1 | SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | C1S, C1R, CLIC1 | NPSR1 348/4885GRIN2D 1201/4885GRIN3B 1932/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.