Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | PRKCA | P17252 | 1/20 | 0.35 |
| ▸ | GRIN2D | O15399 | 3/20 | 0.35 |
| ▸ | GRIN3B | O60391 | 3/20 | 0.35 |
| ▸ | GRIN1 | Q05586 | 3/20 | 0.35 |
| ▸ | GRIN2A | Q12879 | 3/20 | 0.35 |
| ▸ | GRIN2B | Q13224 | 3/20 | 0.35 |
| ▸ | GRIN2C | Q14957 | 3/20 | 0.35 |
| ▸ | GRIN3A | Q8TCU5 | 3/20 | 0.35 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.33 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19809081 | 0.85 | PKM (0.31) | NPSR1PRKCAGAA | |
| SCHEMBL4389248 | 0.80 | ALDH1A1 (0.41) | NPSR1ALDH1A1MEN1HTTKMT2A | |
| SCHEMBL2340118 | 0.77 | ALDH1A1 (0.39) | NPSR1ALDH1A1MEN1HTTKMT2A | |
| SCHEMBL7588760 | 0.75 | — | — | |
| SCHEMBL4135711 | 0.75 | NPSR1 (0.32) | NPSR1ALDH1A1MEN1HTTKMT2A | |
| SCHEMBL26016614 | 0.74 | — | — | |
| SCHEMBL2546505 | 0.74 | NPSR1 (0.43) | NPSR1ALDH1A1MEN1HTTKMT2A | |
| SCHEMBL18643624 | 0.74 | NPSR1 (0.38) | NPSR1ALDH1A1MEN1HTTKMT2A | |
| SCHEMBL270387 | 0.74 | NPSR1 (0.43) | NPSR1ALDH1A1MEN1HTTKMT2A | |
| SCHEMBL386960 | 0.74 | NPSR1 (0.38) | NPSR1ALDH1A1MEN1HTTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4219477-A1 | CYANOTRIAZOLE COMPOUNDS | Otsuka Pharmaceutical Co., Ltd. (JP) | 2023-08-02 | — | — | EP | disclosed |
| US-10626095-B2 | Cyanotriazole compounds | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2020-04-21 | — | — | US | disclosed |
| CN-105408325-B | cyanotriazole compounds | 大塚制药株式会社 | 2019-10-22 | — | — | CN | disclosed |
| US-20160229816-A1 | CYANOTRIAZOLE COMPOUNDS | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |
| EP-3022199-A1 | CYANOTRIAZOLE COMPOUNDS | Otsuka Pharmaceutical Co., Ltd. (JP) | 2016-05-25 | — | — | EP | disclosed |
| CN-105408325-A | Cyanotriazole compounds | OTSUKA PHARMA CO LTD | 2016-03-16 | — | — | CN | disclosed |
| US-9250531-B2 | Method of forming resist pattern and negative tone-development resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-02-02 | — | — | US | disclosed |
| US-9057948-B2 | Resist composition for EUV or EB, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-16 | — | — | US | disclosed |
| US-9023577-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD (JP) | 2015-05-05 | — | — | US | disclosed |
| US-8975010-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-03-10 | — | — | US | disclosed |
| WO-2015008872-A1 | CYANOTRIAZOLE COMPOUNDS | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2015-01-22 | — | — | WO | disclosed |
| US-8632960-B2 | Method of forming resist pattern and negative tone-development resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-01-21 | — | — | US | disclosed |
| US-20140004467-A1 | METHOD OF FORMING RESIST PATTERN AND NEGATIVE TONE-DEVELOPMENT RESIST COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-01-02 | — | — | US | disclosed |
| US-20130164693-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-06-27 | — | — | US | disclosed |
| US-20130143159-A1 | RESIST COMPOSITION FOR EUV OR EB, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-06-06 | — | — | US | disclosed |
| US-20130022911-A1 | POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20120183899-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20110262864-A1 | Method of forming resist pattern and negative tone-development resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-10-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10626095-B2 | Cyanotriazole compounds | CS, PC, ACAT1 | NPSR1 3939/4885ALDH1A1 1611/4885MEN1 3151/4885 |
| US-20160229816-A1 | CYANOTRIAZOLE COMPOUNDS | CS, PC, ACAT1 | NPSR1 3939/4885ALDH1A1 1611/4885MEN1 3151/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.