SCHEMBL8622400

SCHEMBL8622400

C=C(C)C(=O)Oc1cccc2c1C(=O)c1ccccc1C2=O

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TTR P02766 3/20 0.56
▸ MAPT P10636 7/20 0.50
▸ ALDH1A1 P00352 5/20 0.50
▸ MEN1 O00255 5/20 0.50
▸ KMT2A Q03164 5/20 0.50
▸ SMN1; SMN2 Q16637 4/20 0.50
▸ MAPK1 P28482 3/20 0.50
▸ LMNA P02545 2/20 0.50
▸ KDM4E B2RXH2 2/20 0.50
▸ USP2 O75604 2/20 0.50
▸ ADORA2A P29274 2/20 0.50
▸ ABCC4 O15439 1/20 0.50
▸ TP53 P04637 1/20 0.50
▸ HSP90AA1 P07900 1/20 0.50
▸ CHRM2 P08172 1/20 0.50
▸ HSP90AB1 P08238 1/20 0.50
▸ HTR1A P08908 1/20 0.50
▸ ADRA2A P08913 1/20 0.50
▸ ADORA3 P0DMS8 1/20 0.50
▸ CHRM1 P11229 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17460659 0.88 MAOA (0.56) TTRMAPTALDH1A1MEN1KMT2A
SCHEMBL11101186 0.85 TTR (0.72) TTRMAPTALDH1A1MEN1KMT2A
SCHEMBL7199740 0.84 ELANE (0.51) TTRMAPTALDH1A1MEN1KMT2A
SCHEMBL29117714 0.82 ELANE (0.45) TTRMAPTALDH1A1MEN1KMT2A
SCHEMBL17460658 0.82 MEN1 (0.56) TTRMAPTALDH1A1MEN1KMT2A
SCHEMBL28341314 0.81 ELANE (0.57) TTRMAPTALDH1A1MEN1KMT2A
SCHEMBL29019962 0.81 KCNA3 (0.51) TTRMAPTALDH1A1MEN1KMT2A
SCHEMBL23212346 0.80 TTR (0.57) TTRMAPTALDH1A1MEN1KMT2A
SCHEMBL8064482 0.80 KCNA3 (0.43) TTRMAPTALDH1A1MEN1KMT2A
SCHEMBL8619926 0.80 ELANE (0.51) TTRMAPTALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0842112-A1 AQUEOUS PHASE PRODUCTION OF HYDROGEN PEROXIDE AND CATALYSTS FOR USE THEREIN Peroxco Inc. (CA) 1998-05-20 — — EP claimed
US-5624543-A OXIDATION OF POLYMER-LINKED ANTHRAHYDROQUINONE PEROXCO INCORPORATED (CA) 1997-04-29 — — US claimed
WO-1997005058-A1 AQUEOUS PHASE PRODUCTION OF HYDROGEN PEROXIDE AND CATALYSTS FOR USE THEREIN PEROXCO INC. (CA) 1997-02-13 — — WO claimed
EP-3935111-B1 CURABLE INK COMPOSITIONS DOMINO PRINTING SCIENCES PLC (GB) 2025-07-23 — — EP disclosed
US-12071556-B2 Curable ink composition DOMINO PRINTING SCIENCES PLC (GB) 2024-08-27 — — US disclosed
US-20220145109-A1 Curable Ink Composition DOMINO PRINTING SCIENCES PLC (GB) 2022-05-12 — — US disclosed
EP-3935111-A1 CURABLE INK COMPOSITIONS Domino Printing Sciences PLC (GB) 2022-01-12 — — EP disclosed
WO-2020182640-A1 CURABLE INK COMPOSITIONS DOMINO PRINTING SCIENCES PLC (GB) 2020-09-17 — — WO disclosed
CN-110461617-A Receive solution, receive the ink group of solution containing this and the manufacturing method of the printed matter using the ink group DNP FINE CHEMICALS CO LTD 2019-11-15 — — CN disclosed
CN-110461616-A Receive solution, receive the ink group of solution containing this and the manufacturing method of the printed matter using the ink group DNP FINE CHEMICALS CO LTD 2019-11-15 — — CN disclosed
CN-107429078-B Colored resin composition, color filter, and image display device 三菱化学株式会社 2019-10-15 — — CN disclosed
CN-100474062-C Radiation sensitive resin composition for forming microlens JSR CORP (JP) 2009-04-01 — — CN disclosed
CN-101165592-A Dry film, micro-lens and manufacturing method thereof JSR CO LTD (JP) 2008-04-23 — — CN disclosed
CN-1906524-A Resin composition for liquid crystal panel, color filter using the same, and liquid crystal panel MITSUBISHI CHEM CORP (JP) 2007-01-31 — — CN disclosed
CN-1752845-A Ray sensitive resin composition for forming interlayer insulation film and interlayer insulation film JSR CORP (JP) 2006-03-29 — — CN disclosed
CN-1743913-A Radiation sensitive resin composition for forming microlens JSR CORP (JP) 2006-03-08 — — CN disclosed
CN-1670625-A Formation of projections and spacers and radiation sensitive resin composition for the same JSR CORP (JP) 2005-09-21 — — CN disclosed
US-5624543-A OXIDATION OF POLYMER-LINKED ANTHRAHYDROQUINONE PEROXCO INCORPORATED (CA) 1997-04-29 — — US disclosed
US-4797347-A Process for producing electrically conductive coating CIBA-GEIGY CORPORATION (US) 1989-01-10 — — US disclosed
US-4677155-A Anthroquinonyl photosensitive polymers CIBA-GEIGY CORPORATION (US) 1987-06-30 — — US disclosed
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