SCHEMBL17460658

SCHEMBL17460658

C=C(C)C(=O)Oc1ccc(O)c2c1C(=O)c1ccccc1C2=O

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 9/20 0.56
▸ KMT2A Q03164 9/20 0.56
▸ MAPT P10636 9/20 0.56
▸ MAOA P21397 4/20 0.56
▸ TDP1 Q9NUW8 4/20 0.47
▸ POLB P06746 4/20 0.47
▸ SMN1; SMN2 Q16637 4/20 0.47
▸ HPGD P15428 3/20 0.47
▸ MCL1 Q07820 3/20 0.47
▸ PABPC1 P11940 1/20 0.47
▸ CSNK1A1 P48729 1/20 0.47
▸ CSNK1D P48730 1/20 0.47
▸ BLM P54132 1/20 0.47
▸ PLEC Q15149 1/20 0.47
▸ CSNK1G1 Q9HCP0 1/20 0.47
▸ ALDH1A1 P00352 5/20 0.47
▸ KDM4E B2RXH2 3/20 0.47
▸ USP2 O75604 1/20 0.47
▸ DUSP3 P51452 1/20 0.47
▸ PIM1 P11309 2/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13183079 0.86 MAPT (0.61) MEN1KMT2AMAPTMAOATDP1
SCHEMBL17460659 0.82 MAOA (0.56) MEN1KMT2AMAPTMAOATDP1
SCHEMBL8622400 0.82 TTR (0.56) MEN1KMT2AMAPTMAOATDP1
SCHEMBL13609804 0.82 MAPT (0.48) MEN1KMT2AMAPTMAOATDP1
SCHEMBL8612875 0.81 MAPT (0.63) MEN1KMT2AMAPTMAOATDP1
SCHEMBL13609806 0.81 MAOA (0.56) MEN1KMT2AMAPTMAOATDP1
SCHEMBL13609808 0.79 CYP1A2 (0.44) MEN1KMT2AMAPTMAOATDP1
SCHEMBL28916427 0.78 KMT2A (0.79) MEN1KMT2AMAPTMAOATDP1
SCHEMBL7991657 0.78 KMT2A (0.58) MEN1KMT2AMAPTMAOATDP1
SCHEMBL497339 0.77 MAPT (0.60) MEN1KMT2AMAPTMAOATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9244350-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-01-26 — — US disclosed
US-9244350-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-01-26 — — US disclosed
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