SCHEMBL86241

SCHEMBL86241

Cc1c(C)c(C)c(Oc2c(C)c(C)c(C)c(C)c2C)c(C)c1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16940801 0.83
SCHEMBL14032332 0.83 ALOX5 (0.33)
SCHEMBL15362871 0.80
SCHEMBL16940800 0.76
SCHEMBL12940399 0.74 KDM4E (0.38)
SCHEMBL9064360 0.70 CYP3A4 (0.32)
Hexamethylbenzene SCHEMBL114857 0.67 RXFP1 (0.33)
SCHEMBL2495732 0.67 ACHE (0.36)
SCHEMBL6688853 0.67
SCHEMBL4858236 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11820955-B2 Dispersants derived from aromatic polyamines, lubricants, and methods INTERNATIONAL PETROLEUM PRODUCTS & ADDITIVES COMPANY, INC. (US) 2023-11-21 US disclosed
US-20230313065-A1 Dispersants Derived from Aromatic Polyamines, Lubricants, and Methods INTERNATIONAL PETROLEUM PRODUCTS & ADDITIVES COMPANY, INC. (US) 2023-10-05 US disclosed
US-20130286338-A1 Liquid Crystal Display Device and Method of Fabricating the Same LG DISPLAY CO LTD (KR) 2013-10-31 US disclosed
US-8349997-B2 Method for production of block copolymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-01-08 US disclosed
US-8258503-B2 Charge generation layer doped with dihalogen ether XEROX CORPORATION (US) 2012-09-04 US disclosed
US-8129081-B2 Photoconductive imaging members XEROX CORPORATION (US) 2012-03-06 US disclosed
US-20100230661-A1 CHARGE GENERATION LAYER DOPED WITH DIHALOGEN ETHER XEROX CORPORATION (US) 2010-09-16 US disclosed
US-20100099823-A1 METHOD FOR PRODUCTION OF BLOCK COPOLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-04-22 US disclosed
US-20100068639-A1 PHOTOCONDUCTIVE IMAGING MEMBERS XEROX CORPORATION (US) 2010-03-18 US disclosed
US-20090045725-A1 POLYARYLENE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-02-19 US disclosed