SCHEMBL863319

SCHEMBL863319

Nc1c(C(F)(F)F)cc(Cc2cc(C(F)(F)F)c(N)c(C(F)(F)F)c2)cc1C(F)(F)F

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.38
GLA P06280 1/20 0.38
POLB P06746 1/20 0.38
GAA P10253 1/20 0.38
IDO1 P14902 3/20 0.37
ADRB2 P07550 6/20 0.33
ADRB1 P08588 1/20 0.33
ALDH1A1 P00352 4/20 0.32
KDM4E B2RXH2 3/20 0.32
KMT2A Q03164 3/20 0.32
KIF11 P52732 1/20 0.32
CA12 O43570 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA4 P22748 1/20 0.32
CA6 P23280 1/20 0.32
CA5A P35218 1/20 0.32
CA7 P43166 1/20 0.32
CA9 Q16790 1/20 0.32
CA14 Q9ULX7 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3317064 0.81 KIF11 (0.43) TSHRGLAPOLBGAAIDO1
SCHEMBL3311318 0.81 IDO1 (0.39) TSHRGLAPOLBGAAIDO1
SCHEMBL9861446 0.76 LIMK1 (0.39) POLBGAAADRB2KMT2AMAPT
SCHEMBL11844970 0.76 GAA (0.54) TSHRGLAPOLBGAAADRB2
SCHEMBL8993265 0.76 TSHR (0.42) TSHRGLAPOLBGAAADRB2
SCHEMBL14421389 0.75 ALDH1A1 (0.38) TSHRGAAIDO1ALDH1A1KDM4E
SCHEMBL15764638 0.75 MEN1 (0.44) TSHRGLAPOLBGAAADRB2
SCHEMBL1810720 0.75 GAA (0.48) TSHRGLAPOLBGAAIDO1
SCHEMBL394903 0.74 TSHR (0.41) TSHRGLAPOLBGAAIDO1
SCHEMBL15764632 0.73 MEN1 (0.46) TSHRGLAPOLBGAAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11584651-B2 Porous carbon and method of manufacturing same TOYO TANSO CO., LTD. (JP) 2023-02-21 US disclosed
EP-3042877-B1 POROUS CARBON AND ITS USE AS HUMIDITY-CONTROLLING ADSORBENT MATERIAL, AS ADSORBENT IN A HEAT PUMP OR AS ELECTRODE IN A FUEL CELL TOYO TANSO CO (JP) 2021-02-17 EP disclosed
US-10137405-B2 Porous carbon, humidity control adsorbent, adsorption heat pump, and fuel cell TOYO TANSO CO., LTD. (JP) 2018-11-27 US disclosed
US-20160199809-A1 POROUS CARBON, HUMIDITY CONTROL ADSORBENT, ADSORPTION HEAT PUMP, AND FUEL CELL TOYO TANSO CO., LTD. (JP) 2016-07-14 US disclosed
EP-3042877-A1 POROUS CARBON, HUMIDITY-CONTROLLING ADSORBENT MATERIAL, ADSORPTION-TYPE HEAT PUMP, AND FUEL CELL Toyo Tanso Co., Ltd. (JP) 2016-07-13 EP disclosed
US-9248442-B2 Porous carbon and method of manufacturing same TOYO TANSO CO., LTD. (JP) 2016-02-02 US disclosed
EP-2975002-A1 ADSORBING/DESORBING MATERIAL Toyo Tanso Co., Ltd. (JP) 2016-01-20 EP disclosed
US-20150367323-A1 ADSORBING/DESORBING AGENT TOYO TANSO CO., LTD. (JP) 2015-12-24 US disclosed
US-20150344316-A1 POROUS CARBON AND METHOD OF MANUFACTURING SAME TOYO TANSO CO., LTD. (JP) 2015-12-03 US disclosed
US-9156694-B2 Porous carbon and method of manufacturing same TOYO TANSO CO., LTD. (JP) 2015-10-13 US disclosed
US-20060251379-A1 Optical element, process for producing optical element, coating equipment, and coating method KURODA TOSHIHIRO 2006-11-09 US disclosed
US-20040234222-A1 Optical element, method of producing optical elements, coating device, and coating method HITACHI CHEMICAL COMPANY, LTD. (JP) 2004-11-25 US disclosed
US-6810181-B2 LAYER OF A FLUORINE-CONTAINING POLYIMIDE AND A LAYER OF A FLUORINE-FREE RESIN IS INTERPOSED BETWEEN THE POLYIMIDE LAYER AND THE ELECTRODE HITACHI CHEMICAL CO., LTD. (JP) 2004-10-26 US disclosed
US-20040096161-A1 Electrode structure HITACHI CHEMICAL CO., LTD. (JP) 2004-05-20 US disclosed
US-6001277-A Liquid-crystal alignment film HITACHI CHEMICAL COMPANY, LTD. (JP) 1999-12-14 US disclosed
US-5571579-A FORMING A POLYIMIDE FILM AND RUBBING THE SURFACE OF THE FILM HITACHI CHEMICAL COMPANY, LTD (JP) 1996-11-05 US disclosed
EP-0450926-B1 Fluorine-containing polyimides and precursors thereof HITACHI CHEMICAL CO LTD (JP) 1996-07-31 EP disclosed
US-5401878-A Fluorinated unsaturated alkyl ether aryldiamines for polyimide polymers with heat resistance and waterproofing HITACHI CHEMICAL COMPANY, LTD. (JP) 1995-03-28 US disclosed
US-5270438-A Fluorine-containing polyimides and precursors thereof HITACHI CHEMICAL COMPANY, LTD. (JP) 1993-12-14 US disclosed
EP-0450926-A2 Fluorine-containing polyimides and precursors thereof Hitachi Chemical Co., Ltd. (JP) 1991-10-09 EP disclosed