SCHEMBL8633351

SCHEMBL8633351

O=Cc1ccc(OCCC2OCCO2)cc1

nearest known ligand 0.54

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.54
KDM4E B2RXH2 2/20 0.54
HPGD P15428 4/20 0.47
MAPT P10636 2/20 0.47
SMN1; SMN2 Q16637 2/20 0.47
LMNA P02545 1/20 0.47
KMT2A Q03164 2/20 0.42
CYP2A6 P11509 1/20 0.39
ALDH2 P05091 1/20 0.38
MAOA P21397 1/20 0.38
MAOB P27338 1/20 0.38
RAB9A P51151 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8844957 0.94 ALDH1A1 (0.47) ALDH1A1KDM4EHPGDMAPTSMN1; SMN2
SCHEMBL27950338 0.92 ALDH1A1 (0.53) ALDH1A1KDM4EHPGDMAPTSMN1; SMN2
SCHEMBL11385685 0.91 ALDH1A1 (0.51) ALDH1A1KDM4EHPGDMAPTSMN1; SMN2
SCHEMBL14166261 0.89 ALDH1A1 (0.50) ALDH1A1KDM4EHPGDMAPTSMN1; SMN2
SCHEMBL12933666 0.87 ALDH1A1 (0.48) ALDH1A1KDM4EHPGDMAPTSMN1; SMN2
SCHEMBL8845038 0.85 CHRNB2 (0.47) ALDH1A1KDM4EHPGDMAPTKMT2A
SCHEMBL8104626 0.82 ALDH1A1 (0.49) ALDH1A1KDM4EHPGDMAPTSMN1; SMN2
SCHEMBL8845184 0.79 CHRNB2 (0.45) ALDH1A1HPGDMAPTKMT2AALDH2
SCHEMBL18789967 0.78 ALDH1A1 (0.48) ALDH1A1KDM4EHPGDMAPTSMN1; SMN2
SCHEMBL16761852 0.78 HPGD (0.52) ALDH1A1KDM4EHPGDMAPTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5723258-A Acetal group-containing alkoxy-styrene polymers, method of preparing the same and chemical amplified photoresist composition mainly comprising the same KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 1998-03-03 US disclosed
US-5665841-A Acetal group-containing alkoxy-styrene polymers, method of preparing the same and chemical amplified photoresist composition mainly comprising the same KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 1997-09-09 US disclosed