SCHEMBL8649315

SCHEMBL8649315

O=C(c1ccnc(O)c1)c1ccc(O)c(O)c1O

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HDAC1 Q13547 1/20 0.59
▸ KDM4E B2RXH2 2/20 0.50
▸ ALDH1A1 P00352 2/20 0.50
▸ MAPT P10636 2/20 0.50
▸ HPGD P15428 2/20 0.50
▸ ALOX15 P16050 2/20 0.50
▸ RECQL P46063 2/20 0.50
▸ HSD17B10 Q99714 2/20 0.50
▸ MEN1 O00255 2/20 0.50
▸ KMT2A Q03164 2/20 0.50
▸ ALOX12 P18054 1/20 0.50
▸ SELL P14151 1/20 0.44
▸ SELP P16109 1/20 0.44
▸ HSD17B14 Q9BPX1 2/20 0.38
▸ IGFBP3 P17936 1/20 0.38
▸ TERT O14746 1/20 0.36
▸ PIK3CA P42336 3/20 0.36
▸ COMT P21964 1/20 0.35
▸ USP2 O75604 1/20 0.34
▸ GAA P10253 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8655190 0.81 HDAC1 (0.70) HDAC1KDM4EALDH1A1MAPTHPGD
SCHEMBL8650745 0.79 IGFBP3 (0.40) HDAC1KDM4EALDH1A1MAPTHPGD
SCHEMBL30669853 0.78 HDAC1 (0.84) HDAC1KDM4EALDH1A1MAPTHPGD
SCHEMBL6847401 0.78 HDAC1 (0.84) HDAC1KDM4EALDH1A1MAPTHPGD
SCHEMBL30103853 0.77 HDAC1 (0.75) HDAC1KDM4EALDH1A1MAPTHPGD
SCHEMBL6842062 0.77 HDAC1 (0.69) HDAC1KDM4EALDH1A1MAPTHPGD
SCHEMBL5703332 0.77 HDAC1 (0.75) HDAC1KDM4EALDH1A1MAPTHPGD
SCHEMBL30669855 0.77 HDAC1 (0.69) HDAC1KDM4EALDH1A1MAPTHPGD
SCHEMBL3656665 0.76 HDAC1 (0.73) HDAC1KDM4EALDH1A1MAPTHPGD
SCHEMBL31676578 0.75 HDAC1 (0.67) HDAC1KDM4EALDH1A1MAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0443533-B1 Positive photoresist composition FUJI PHOTO FILM CO LTD (JP) 1998-09-30 — — EP disclosed
EP-0443533-A2 Positive photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1991-08-28 — — EP disclosed
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