SCHEMBL8650745

SCHEMBL8650745

O=C(c1ccnc(O)c1)c1cc(O)c(O)cc1O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ IGFBP3 P17936 1/20 0.40
▸ HPGD P15428 5/20 0.38
▸ MAPT P10636 3/20 0.38
▸ KDM4E B2RXH2 2/20 0.38
▸ RECQL P46063 2/20 0.38
▸ HSD17B10 Q99714 2/20 0.38
▸ LMNA P02545 2/20 0.38
▸ CYP3A4 P08684 1/20 0.38
▸ MEN1 O00255 2/20 0.36
▸ KMT2A Q03164 2/20 0.36
▸ USP2 O75604 1/20 0.36
▸ GAA P10253 1/20 0.36
▸ KEAP1 Q14145 1/20 0.36
▸ NFE2L2 Q16236 1/20 0.36
▸ ALDH1A1 P00352 5/20 0.35
▸ KDM4C Q9H3R0 2/20 0.35
▸ KDM6B O15054 1/20 0.35
▸ TET3 O43151 1/20 0.35
▸ KDM4A O75164 1/20 0.35
▸ BBOX1 O75936 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8649315 0.79 HDAC1 (0.59) IGFBP3HPGDMAPTKDM4ERECQL
SCHEMBL8649732 0.77 HPGD (0.39) HPGDMAPTKDM4ERECQLHSD17B10
SCHEMBL8654204 0.76 FASN (0.53) IGFBP3HPGDMAPTKDM4ERECQL
SCHEMBL8649376 0.75 MAPT (0.38) HPGDMAPTKDM4ERECQLHSD17B10
SCHEMBL19003399 0.75 CA12 (0.56) IGFBP3HPGDMAPTKDM4ERECQL
SCHEMBL29643176 0.72 KDM4C (0.63) MAPTKDM4EGAAALDH1A1KDM4C
SCHEMBL186166 0.72 KDM4C (0.63) MAPTKDM4EGAAALDH1A1KDM4C
SCHEMBL8655032 0.71 CES2 (0.38) IGFBP3HPGDMAPTKDM4ERECQL
SCHEMBL25269346 0.71 KDM4C (0.61) MAPTKDM4EGAAALDH1A1KDM4C
SCHEMBL25258723 0.71 KDM4C (0.61) MAPTKDM4EGAAALDH1A1KDM4C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0443533-B1 Positive photoresist composition FUJI PHOTO FILM CO LTD (JP) 1998-09-30 — — EP disclosed
EP-0443533-A2 Positive photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1991-08-28 — — EP disclosed
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