SCHEMBL8650520

SCHEMBL8650520

O=C(c1cc(O)ccn1)c1c(O)cc(O)cc1O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ FASN P49327 1/20 0.48
▸ CYP3A4 P08684 5/20 0.41
▸ MEN1 O00255 4/20 0.41
▸ KMT2A Q03164 4/20 0.41
▸ HPGD P15428 2/20 0.41
▸ PTGS1 P23219 1/20 0.37
▸ DRD3 P35462 1/20 0.37
▸ MAPT P10636 4/20 0.36
▸ ALDH1A1 P00352 4/20 0.36
▸ KDM4E B2RXH2 3/20 0.36
▸ KDM6B O15054 1/20 0.36
▸ TET3 O43151 1/20 0.36
▸ KDM4A O75164 1/20 0.36
▸ BBOX1 O75936 1/20 0.36
▸ KDM5A P29375 1/20 0.36
▸ KDM5C P41229 1/20 0.36
▸ ASPH Q12797 1/20 0.36
▸ KDM4D Q6B0I6 1/20 0.36
▸ TET2 Q6N021 1/20 0.36
▸ ALKBH5 Q6P6C2 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8655032 0.76 CES2 (0.38) MEN1KMT2AHPGDMAPTALDH1A1
SCHEMBL8654905 0.74 FASN (0.48) FASNCYP3A4MEN1KMT2AHPGD
SCHEMBL8654204 0.74 FASN (0.53) FASNCYP3A4MEN1KMT2AHPGD
SCHEMBL65841 0.74 KDM4E (0.63) MAPTALDH1A1KDM4EKDM6BTET3
SCHEMBL29951101 0.74 KDM4E (0.63) MAPTALDH1A1KDM4EKDM6BTET3
SCHEMBL8652534 0.74 HDAC1 (0.50) MEN1KMT2AHPGDMAPTALDH1A1
Bromide SCHEMBL9518799 0.72 KDM4E (0.61) MAPTALDH1A1KDM4EKDM6BTET3
SCHEMBL596161 0.72 KDM4E (0.61) MAPTALDH1A1KDM4EKDM6BTET3
Hydrochloric Acid SCHEMBL11711987 0.72 ALDH1A1 (0.41) MAPTALDH1A1KDM4EKDM6BTET3
SCHEMBL593577 0.72 KDM4E (0.61) MAPTALDH1A1KDM4EKDM6BTET3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0443533-B1 Positive photoresist composition FUJI PHOTO FILM CO LTD (JP) 1998-09-30 — — EP disclosed
EP-0443533-A2 Positive photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1991-08-28 — — EP disclosed
Send feedback