SCHEMBL8655032

SCHEMBL8655032

O=C(c1cc(O)ccn1)c1cc(O)c(O)cc1O

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CES2 O00748 1/20 0.38
▸ CHRNA7 P36544 2/20 0.38
▸ ALDH1A1 P00352 5/20 0.37
▸ CA12 O43570 3/20 0.37
▸ CA1 P00915 3/20 0.37
▸ CA2 P00918 3/20 0.37
▸ CA7 P43166 3/20 0.37
▸ CA9 Q16790 3/20 0.37
▸ CA14 Q9ULX7 3/20 0.37
▸ TSHR P16473 2/20 0.37
▸ MEN1 O00255 1/20 0.36
▸ USP2 O75604 1/20 0.36
▸ GAA P10253 1/20 0.36
▸ KMT2A Q03164 1/20 0.36
▸ KEAP1 Q14145 1/20 0.36
▸ NFE2L2 Q16236 1/20 0.36
▸ KDM4E B2RXH2 2/20 0.35
▸ KDM6B O15054 1/20 0.35
▸ TET3 O43151 1/20 0.35
▸ KDM4A O75164 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8652534 0.79 HDAC1 (0.50) CES2ALDH1A1CA12CA1CA2
SCHEMBL8650520 0.76 FASN (0.48) CES2CHRNA7ALDH1A1CA12CA1
SCHEMBL8652554 0.75 CES2 (0.38) CES2CHRNA7ALDH1A1CA12CA1
SCHEMBL65841 0.72 KDM4E (0.63) ALDH1A1CA12CA1CA2CA7
SCHEMBL29951101 0.72 KDM4E (0.63) ALDH1A1CA12CA1CA2CA7
SCHEMBL8650745 0.71 IGFBP3 (0.40) CHRNA7ALDH1A1TSHRMEN1USP2
SCHEMBL22156270 0.71 CES2 (0.61) CES2CHRNA7ALDH1A1CA12CA1
SCHEMBL593577 0.71 KDM4E (0.61) ALDH1A1CA12CA1CA2CA7
SCHEMBL596161 0.71 KDM4E (0.61) ALDH1A1CA12CA1CA2CA7
Bromide SCHEMBL9518799 0.71 KDM4E (0.61) ALDH1A1CA12CA1CA2CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0443533-B1 Positive photoresist composition FUJI PHOTO FILM CO LTD (JP) 1998-09-30 — — EP disclosed
EP-0443533-A2 Positive photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1991-08-28 — — EP disclosed
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