SCHEMBL8658489

SCHEMBL8658489

C=Cc1ccc(S(=O)(=O)NC(=O)c2ccccc2)cc1

nearest known ligand 0.65

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
FLT1 P17948 3/20 0.65
FLT4 P35916 3/20 0.65
KDR P35968 3/20 0.65
MEN1 O00255 1/20 0.65
LMNA P02545 1/20 0.65
KMT2A Q03164 1/20 0.65
L3MBTL1 Q9Y468 1/20 0.65
PTGS2 P35354 2/20 0.52
MCL1 Q07820 5/20 0.52
BCL2L1 Q07817 4/20 0.52
PTGS1 P23219 1/20 0.51
AKR1C2 P52895 1/20 0.51
AKR1C1 Q04828 1/20 0.51
HTT P42858 1/20 0.50
P4HTM Q9NXG6 3/20 0.49
KAT6A Q92794 1/20 0.49
TDP1 Q9NUW8 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Styrene SCHEMBL8648561 0.98 FLT1 (0.63) FLT1FLT4KDRMEN1LMNA
SCHEMBL8520954 0.94 FLT1 (0.56) FLT1FLT4KDRMEN1LMNA
Styrene SCHEMBL8441886 0.92 FLT1 (0.55) FLT1FLT4KDRMEN1LMNA
Styrene SCHEMBL8645680 0.87 HDAC3 (0.51) FLT1FLT4KDRMEN1LMNA
SCHEMBL6276451 0.86 FLT1 (0.67) FLT1FLT4KDRMEN1LMNA
Styrene SCHEMBL8438641 0.86 HTT (0.56) FLT1FLT4KDRMEN1LMNA
SCHEMBL174010 0.83 FLT1 (0.77) FLT1FLT4KDRMEN1LMNA
SCHEMBL8647269 0.82 HDAC3 (0.56) FLT1FLT4KDRMEN1LMNA
SCHEMBL27972428 0.82 FLT1 (0.71) FLT1FLT4KDRMEN1LMNA
SCHEMBL8437461 0.81 GFER (0.58) FLT1FLT4KDRLMNAMCL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5804348-A COLORLESS, METAL-FREE, IMPROVE CHARGE UNIFORMITY EASTMAN KODAK COMPANY (US) 1998-09-08 US claimed
WO-2021065549-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2021-04-08 WO disclosed
US-5804348-A COLORLESS, METAL-FREE, IMPROVE CHARGE UNIFORMITY EASTMAN KODAK COMPANY (US) 1998-09-08 US disclosed