SCHEMBL8665802

SCHEMBL8665802

CCOCCC(=O)OC(=O)CCOCC

nearest known ligand 0.55

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.55
TSHR P16473 2/20 0.46
THRB P10828 1/20 0.40
MGAM O43451 1/20 0.36
GAA P10253 1/20 0.36
SI P14410 1/20 0.36
MGAM2 Q2M2H8 1/20 0.36
SOAT1 P35610 1/20 0.36
NAAA Q02083 1/20 0.33
DGKA P23743 1/20 0.33
TRPA1 O75762 1/20 0.33
CYP1A2 P05177 1/20 0.33
POLB P06746 1/20 0.33
LMNA P02545 1/20 0.32
HSD17B10 Q99714 1/20 0.32
FFAR3 O14843 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21834754 0.89 ALDH1A1 (0.50) ALDH1A1TSHRTHRBMGAMGAA
SCHEMBL249490 0.85 ALDH1A1 (0.50) ALDH1A1TSHRTHRBNAAADGKA
SCHEMBL27502689 0.82 GAA (0.52) ALDH1A1TSHRTHRBMGAMGAA
SCHEMBL4818015 0.82 ALDH1A1 (0.56) ALDH1A1TSHRTHRBMGAMGAA
SCHEMBL3623152 0.82
SCHEMBL37036 0.82 GAA (0.52) ALDH1A1TSHRTHRBMGAMGAA
SCHEMBL108174 0.82
SCHEMBL27291781 0.81 ALDH1A1 (0.46) ALDH1A1TSHRTHRBNAAADGKA
SCHEMBL11616036 0.81 DGKA (0.47) ALDH1A1TSHRNAAADGKALMNA
Hydrochloric Acid SCHEMBL27549704 0.80 GAA (0.50) ALDH1A1TSHRTHRBMGAMGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9023432-B2 Resist material for imprinting, pattern formation method, and imprinting apparatus KABUSHIKI KAISHA TOSHIBA (JP) 2015-05-05 US disclosed
US-20130059090-A1 RESIST MATERIAL FOR IMPRINTING, PATTERN FORMATION METHOD, AND IMPRINTING APPARATUS KABUSHIKI KAISHA TOSHIBA (JP) 2013-03-07 US disclosed
US-5792589-A ORGANIC BINDER; OPTICALLY CROSSLINKABLE COMPOUND; RADICAL-GENERATING AGENT: 2,4,5-TRIARYL IMIDAZOLE DIMER, AMINO-GROUP CONTAINING BENZOPHENONE PHOTOSENSITIZER, A THIOL COMPOUND JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-08-11 US disclosed