SCHEMBL866684

SCHEMBL866684

C=C(CCCCC1(C)CCO1)C(=O)O

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TBXAS1 P24557 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL867254 0.95
SCHEMBL3089380 0.86 THRB (0.34) TBXAS1
SCHEMBL3071226 0.85 FNTA (0.37) TBXAS1
SCHEMBL3081437 0.81 THRB (0.32) TBXAS1
SCHEMBL866334 0.81 THRB (0.31) TBXAS1
SCHEMBL867099 0.75
SCHEMBL866993 0.74 GRIK1 (0.33)
SCHEMBL2025802 0.71 TBXAS1 (0.47) TBXAS1
SCHEMBL866685 0.70 CD81 (0.43)
SCHEMBL4133292 0.69 PAOX (0.46) TBXAS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8787723-B2 Resin composition for forming optical waveguide, resin film for forming optical waveguide, and optical waveguide HITACHI CHEMICAL COMPANY, LTD. (JP) 2014-07-22 US disclosed
US-8632952-B2 Photosensitive resin composition, photosensitive resin cured matter, photosensitive resin film, photosensitive resin film cured matter and optical waveguide obtained by using the same HITACHI CHEMICAL COMPANY, LTD. (JP) 2014-01-21 US disclosed
EP-2045629-B1 RESIN COMPOSITION FOR OPTICAL WAVEGUIDE, RESIN FILM FOR OPTICAL WAVEGUIDE, AND OPTICAL WAVEGUIDE HITACHI CHEMICAL CO LTD (JP) 2013-09-04 EP disclosed
US-20120076468-A1 RESIN COMPOSITION FOR FORMING OPTICAL WAVEGUIDE, RESIN FILM FOR FORMING OPTICAL WAVEGUIDE, AND OPTICAL WAVEGUIDE HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-03-29 US disclosed
US-8036511-B2 Resin composition for optical material, resin film for optical material, and optical waveguide HITACHI CHEMICAL COMPANY, LTD. (JP) 2011-10-11 US disclosed
US-20110075981-A1 RESIN COMPOSITION FOR OPTICAL MATERIAL, RESIN FILM FOR OPTICAL MATERIAL, AND OPTICAL WAVEGUIDE MAKINO TATSUYA 2011-03-31 US disclosed
US-7853113-B2 Resin composition for optical material, resin film for optical material, and optical waveguide HITACHI CHEMICAL COMPANY, LTD. (JP) 2010-12-14 US disclosed
US-20100221668-A1 RESIN COMPOSITION FOR OPTICAL MATERIAL, RESIN FILM FOR OPTICAL MATERIAL, AND OPTICAL WAVEGUIDE MAKINO TATSUYA 2010-09-02 US disclosed
US-20100027950-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN CURED MATTER, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE RESIN FILM CURED MATTER AND OPTICAL WAVEGUIDE OBTAINED BY USING THE SAME HITACHI CHEMICAL COMPANY, LTD. (JP) 2010-02-04 US disclosed
EP-2045629-A1 RESIN COMPOSITION FOR OPTICAL MATERIAL, RESIN FILM FOR OPTICAL MATERIAL, AND OPTICAL WAVEGUIDE Hitachi Chemical Company, Ltd. (JP) 2009-04-08 EP disclosed