SCHEMBL867254

SCHEMBL867254

C=C(CCCC1(C)CCO1)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL866684 0.95 TBXAS1 (0.32)
SCHEMBL3081437 0.86 THRB (0.32)
SCHEMBL3089380 0.81 THRB (0.34)
SCHEMBL867099 0.80
SCHEMBL3071226 0.79 FNTA (0.37)
SCHEMBL866993 0.76 GRIK1 (0.33)
SCHEMBL866334 0.76 THRB (0.31)
SCHEMBL3427890 0.74 EPHX1 (0.38)
SCHEMBL3095025 0.72 THRB (0.30)
SCHEMBL866685 0.71 CD81 (0.43)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8787723-B2 Resin composition for forming optical waveguide, resin film for forming optical waveguide, and optical waveguide HITACHI CHEMICAL COMPANY, LTD. (JP) 2014-07-22 US disclosed
US-8632952-B2 Photosensitive resin composition, photosensitive resin cured matter, photosensitive resin film, photosensitive resin film cured matter and optical waveguide obtained by using the same HITACHI CHEMICAL COMPANY, LTD. (JP) 2014-01-21 US disclosed
EP-2045629-B1 RESIN COMPOSITION FOR OPTICAL WAVEGUIDE, RESIN FILM FOR OPTICAL WAVEGUIDE, AND OPTICAL WAVEGUIDE HITACHI CHEMICAL CO LTD (JP) 2013-09-04 EP disclosed
US-20120076468-A1 RESIN COMPOSITION FOR FORMING OPTICAL WAVEGUIDE, RESIN FILM FOR FORMING OPTICAL WAVEGUIDE, AND OPTICAL WAVEGUIDE HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-03-29 US disclosed
US-8036511-B2 Resin composition for optical material, resin film for optical material, and optical waveguide HITACHI CHEMICAL COMPANY, LTD. (JP) 2011-10-11 US disclosed
US-20110075981-A1 RESIN COMPOSITION FOR OPTICAL MATERIAL, RESIN FILM FOR OPTICAL MATERIAL, AND OPTICAL WAVEGUIDE MAKINO TATSUYA 2011-03-31 US disclosed
US-7853113-B2 Resin composition for optical material, resin film for optical material, and optical waveguide HITACHI CHEMICAL COMPANY, LTD. (JP) 2010-12-14 US disclosed
US-20100221668-A1 RESIN COMPOSITION FOR OPTICAL MATERIAL, RESIN FILM FOR OPTICAL MATERIAL, AND OPTICAL WAVEGUIDE MAKINO TATSUYA 2010-09-02 US disclosed
US-7747129-B2 Resin composition for optical materials, resin film for optical material, and optical waveguide HITACHI CHEMICAL COMPANY, LTD. (JP) 2010-06-29 US disclosed
US-20100027950-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN CURED MATTER, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE RESIN FILM CURED MATTER AND OPTICAL WAVEGUIDE OBTAINED BY USING THE SAME HITACHI CHEMICAL COMPANY, LTD. (JP) 2010-02-04 US disclosed
US-20090196559-A1 Resin Composition for Optical Materials, Resin Film for Optical Material, and Optical Waveguide HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-08-06 US disclosed
EP-2045629-A1 RESIN COMPOSITION FOR OPTICAL MATERIAL, RESIN FILM FOR OPTICAL MATERIAL, AND OPTICAL WAVEGUIDE Hitachi Chemical Company, Ltd. (JP) 2009-04-08 EP disclosed