Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CAMK2A | Q9UQM7 | 1/20 | 0.40 |
| ▸ | GPR84 | Q9NQS5 | 5/20 | 0.37 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.37 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.37 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.35 |
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.35 |
| ▸ | RNPEP | Q9H4A4 | 1/20 | 0.34 |
| ▸ | CACNA2D1 | P54289 | 2/20 | 0.34 |
| ▸ | CACNB3 | P54284 | 1/20 | 0.34 |
| ▸ | CACNA1C | Q13936 | 1/20 | 0.34 |
| ▸ | PGR | P06401 | 1/20 | 0.34 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.34 |
| ▸ | HTR2B | P41595 | 1/20 | 0.34 |
| ▸ | CACNA2D2 | Q9NY47 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | GABRR1 | P24046 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 1,4-Butanediol SCHEMBL868841 | 0.95 | GPR84 (0.42) | CAMK2AGPR84FFAR1FFAR4SLC22A6 | |
| 1,6-Hexanediol SCHEMBL15379163 | 0.93 | GPR84 (0.46) | CAMK2AGPR84FFAR1FFAR4SLC22A6 | |
| SCHEMBL4450251 | 0.93 | GPR84 (0.46) | CAMK2AGPR84FFAR1FFAR4SLC22A6 | |
| SCHEMBL15378892 | 0.93 | GPR84 (0.46) | CAMK2AGPR84FFAR1FFAR4SLC22A6 | |
| Ethylene Glycol SCHEMBL29687230 | 0.90 | SLC22A6 (0.39) | SLC22A6TDP1MAPTALDH1A1LMNA | |
| Ethylene Glycol SCHEMBL869747 | 0.90 | SLC22A6 (0.39) | SLC22A6TDP1MAPTALDH1A1LMNA | |
| Butyl Alcohol SCHEMBL30611643 | 0.89 | ALDH1A1 (0.46) | GPR84FFAR1FFAR4SLC22A6TDP1 | |
| SCHEMBL8612540 | 0.87 | — | — | |
| SCHEMBL20966262 | 0.87 | — | — | |
| SCHEMBL98745 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8242217-B2 | Epoxy resin curing agent, process for preparing the same, and epoxy resin composition | SHOWA DENKO K.K. (JP) | 2012-08-14 | — | — | US | claimed |
| EP-2226347-B1 | EPOXY RESIN CURING AGENT, METHOD FOR PRODUCING THE SAME, AND EPOXY RESIN COMPOSITION | SHOWA DENKO KK (JP) | 2012-06-27 | — | — | EP | claimed |
| US-20100273940-A1 | EPOXY RESIN CURING AGENT, PROCESS FOR PREPARING THE SAME, AND EPOXY RESIN COMPOSITION | SHOWA DENKO K.K. (JP) | 2010-10-28 | — | — | US | claimed |
| EP-4667546-A1 | PHOTOCURABLE COMPOSITION | Bostik SA (FR) | 2025-12-24 | — | — | EP | disclosed |
| EP-4667545-A1 | PHOTOCURABLE COMPOSITION | Bostik SA (FR) | 2025-12-24 | — | — | EP | disclosed |
| EP-4570860-A1 | COUMARIN THIOESTER PHOTOINITIATORS | ARKEMA FRANCE (FR) | 2025-06-18 | — | — | EP | disclosed |
| EP-4570811-A1 | POLYMERIZABLE PHOSPHINE OXIDE-BASED PHOTOINITIATORS | ARKEMA FRANCE (FR) | 2025-06-18 | — | — | EP | disclosed |
| EP-4570791-A1 | THIOESTER PHOTOINITIATORS | ARKEMA FRANCE (FR) | 2025-06-18 | — | — | EP | disclosed |
| EP-4393720-A1 | PHOSPHINE OXIDE-BASED PHOTOINITIATORS | ARKEMA FRANCE (FR) | 2024-07-03 | — | — | EP | disclosed |
| US-9709952-B2 | Photosensitive composition for volume hologram recording, photosensitive substrate for volume hologram recording, and volume hologram recorded medium | DAI NIPPON PRINTING CO., LTD. (JP) | 2017-07-18 | — | — | US | disclosed |
| EP-2889700-B1 | PHOTOSENSITIVE COMPOSITION FOR VOLUME HOLOGRAM RECORDING, PHOTOSENSITIVE SUBSTRATE FOR VOLUME HOLOGRAM RECORDING, AND VOLUME HOLOGRAM-RECORDED OBJECT | DAINIPPON PRINTING CO LTD (JP) | 2017-01-25 | — | — | EP | disclosed |
| EP-2436715-B1 | EPOXY RESIN-BASED COATING COMPOSITION | SHOWA DENKO KK (JP) | 2016-08-24 | — | — | EP | disclosed |
| US-20150212487-A1 | PHOTOSENSITIVE COMPOSITION FOR VOLUME HOLOGRAM RECORDING, PHOTOSENSITIVE SUBSTRATE FOR VOLUME HOLOGRAM RECORDING, AND VOLUME HOLOGRAM RECORDED MEDIUM | DAI NIPPON PRINTING CO., LTD. | 2015-07-30 | — | — | US | disclosed |
| EP-2889700-A1 | PHOTOSENSITIVE COMPOSITION FOR VOLUME HOLOGRAM RECORDING, PHOTOSENSITIVE SUBSTRATE FOR VOLUME HOLOGRAM RECORDING, AND VOLUME HOLOGRAM-RECORDED OBJECT | Dai Nippon Printing Co., Ltd. (JP) | 2015-07-01 | — | — | EP | disclosed |
| US-8865801-B2 | Epoxy resin-based coating composition | SHOWA DENKO K.K. (JP) | 2014-10-21 | — | — | US | disclosed |
| US-8242217-B2 | Epoxy resin curing agent, process for preparing the same, and epoxy resin composition | SHOWA DENKO K.K. (JP) | 2012-08-14 | — | — | US | disclosed |
| EP-2226347-B1 | EPOXY RESIN CURING AGENT, METHOD FOR PRODUCING THE SAME, AND EPOXY RESIN COMPOSITION | SHOWA DENKO KK (JP) | 2012-06-27 | — | — | EP | disclosed |
| US-20120077903-A1 | EPOXY RESIN-BASED COATING COMPOSITION | SHOWA DENKO K.K. (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20100273940-A1 | EPOXY RESIN CURING AGENT, PROCESS FOR PREPARING THE SAME, AND EPOXY RESIN COMPOSITION | SHOWA DENKO K.K. (JP) | 2010-10-28 | — | — | US | disclosed |
| EP-2226347-A1 | EPOXY RESIN CURING AGENT, METHOD FOR PRODUCING THE SAME, AND EPOXY RESIN COMPOSITION | Showa Denko K.K. (JP) | 2010-09-08 | — | — | EP | disclosed |