Ethylene Glycol

Ethylene Glycol

SCHEMBL869747

CC(S)CC(=O)O.CC(S)CC(=O)O.OCCO

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC22A6 Q4U2R8 1/20 0.39
TDP1 Q9NUW8 2/20 0.38
MAPT P10636 2/20 0.38
LMNA P02545 2/20 0.38
ALDH1A1 P00352 1/20 0.38
PTGS2 P35354 1/20 0.38
RNPEP Q9H4A4 1/20 0.37
CACNA2D1 P54289 2/20 0.37
CACNB3 P54284 1/20 0.37
CACNA1C Q13936 1/20 0.37
PGR P06401 1/20 0.37
ADRA1A P35348 1/20 0.37
HTR2B P41595 1/20 0.37
CACNA2D2 Q9NY47 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.36
GABRR1 P24046 2/20 0.33
MME P08473 3/20 0.32
ACE P12821 1/20 0.32
CPA1 P15085 1/20 0.32
ACE2 Q9BYF1 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene Glycol SCHEMBL29687230 1.00 SLC22A6 (0.39) SLC22A6TDP1MAPTLMNAALDH1A1
SCHEMBL8612540 0.92
SCHEMBL20966262 0.92
SCHEMBL98745 0.92
1,4-Butanediol SCHEMBL868841 0.90 GPR84 (0.42) SLC22A6TDP1MAPTLMNAALDH1A1
1,3-Propanediol SCHEMBL868133 0.90 CAMK2A (0.40) SLC22A6TDP1MAPTLMNAALDH1A1
Hydrochloric Acid SCHEMBL7707568 0.89
Methyl Alcohol SCHEMBL30549331 0.89 SLC22A6 (0.43) SLC22A6TDP1MAPTLMNAALDH1A1
Methane SCHEMBL17765086 0.89 SLC22A6 (0.43) SLC22A6TDP1MAPTLMNAALDH1A1
SCHEMBL28223573 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 198 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4642651-A1 PHOSPHINE OXIDE-BASED PHOTOINITIATORS ARKEMA France (FR) 2025-11-05 EP claimed
WO-2024141190-A1 PHOSPHINE OXIDE-BASED PHOTOINITIATORS ARKEMA FRANCE (FR) 2024-07-04 WO claimed
US-20170343037-A1 Reclosable Adhesive Strip HENKEL AG & CO. KGAA (DE) 2017-11-30 US claimed
EP-3227397-A2 A RECLOSABLE ADHESIVE STRIP Henkel AG & Co. KGaA (DE) 2017-10-11 EP claimed
EP-2436715-B1 EPOXY RESIN-BASED COATING COMPOSITION SHOWA DENKO KK (JP) 2016-08-24 EP claimed
WO-2016087608-A2 A RECLOSABLE ADHESIVE STRIP HENKEL AG & CO. KGAA (DE) 2016-06-09 WO claimed
US-8865801-B2 Epoxy resin-based coating composition SHOWA DENKO K.K. (JP) 2014-10-21 US claimed
EP-1478668-B1 THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION SHOWA DENKO KK (JP) 2013-04-10 EP claimed
US-8242217-B2 Epoxy resin curing agent, process for preparing the same, and epoxy resin composition SHOWA DENKO K.K. (JP) 2012-08-14 US claimed
EP-2226347-B1 EPOXY RESIN CURING AGENT, METHOD FOR PRODUCING THE SAME, AND EPOXY RESIN COMPOSITION SHOWA DENKO KK (JP) 2012-06-27 EP claimed
US-20120077903-A1 EPOXY RESIN-BASED COATING COMPOSITION SHOWA DENKO K.K. (JP) 2012-03-29 US claimed
US-7989567-B2 Method for production of water/oil repellent composition and article ASAHI GLASS COMPANY, LIMITED (JP) 2011-08-02 US claimed
US-20100273940-A1 EPOXY RESIN CURING AGENT, PROCESS FOR PREPARING THE SAME, AND EPOXY RESIN COMPOSITION SHOWA DENKO K.K. (JP) 2010-10-28 US claimed
EP-2226347-A1 EPOXY RESIN CURING AGENT, METHOD FOR PRODUCING THE SAME, AND EPOXY RESIN COMPOSITION Showa Denko K.K. (JP) 2010-09-08 EP claimed
US-7341828-B2 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2008-03-11 US claimed
US-20050153231-A1 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2005-07-14 US claimed
US-12637544-B2 UV curable silicone composition and cured product thereof DUROPTIX MATERIALS KABUSHIKI KAISHA (JP) 2026-05-26 US disclosed
EP-4692055-A1 THIOL COMPOUND AJINOMOTO CO., INC. (JP) 2026-02-11 EP disclosed
US-20060036023-A1 Color filter black matrix resist composition SHOWA DENKO K.K. (JP) 2006-02-16 US disclosed
US-20050153231-A1 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2005-07-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12637544-B2 UV curable silicone composition and cured product thereof QSOX1, MGMT, TST SLC22A6 3997/4885TDP1 400/4885MAPT 1377/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.