⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL98537 | 0.94 | MAPK1 (0.31) | — | |
| SCHEMBL868957 | 0.93 | ALDH1A1 (0.37) | — | |
| SCHEMBL18100198 | 0.93 | — | — | |
| SCHEMBL20739973 | 0.91 | ALDH1A1 (0.38) | — | |
| SCHEMBL31483833 | 0.90 | ALDH1A1 (0.37) | — | |
| SCHEMBL31483860 | 0.90 | ALDH1A1 (0.37) | — | |
| SCHEMBL18179723 | 0.89 | MMP1 (0.36) | — | |
| SCHEMBL25011702 | 0.87 | — | — | |
| SCHEMBL13129066 | 0.87 | — | — | |
| SCHEMBL24234922 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 403 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119667078-A | Method for measuring water content in polythiol compound | 新疆兴发化工有限公司 | 2025-03-21 | — | — | CN | claimed |
| CN-118684608-A | Method for reducing acid value of polythiol compound | 益丰新材料股份有限公司 | 2024-09-24 | — | — | CN | claimed |
| CN-118125953-A | Method for reducing activity of polythiol compound | 益丰新材料股份有限公司 | 2024-06-04 | — | — | CN | claimed |
| CN-111263777-B | Curable composition containing thiol compound | 阿科玛法国公司 | 2023-03-28 | — | — | CN | claimed |
| EP-3145723-B1 | LIQUID JET HEAD AND METHOD FOR PRODUCING SAME, AND LIQUID JET APPARATUS AND IMAGE FORMING APPARATUS | RICOH CO LTD (JP) | 2018-09-05 | — | — | EP | claimed |
| US-9757944-B2 | Liquid jet head and method for producing same, and liquid jet apparatus and image forming apparatus | RICOH COMPANY, LTD. (JP) | 2017-09-12 | — | — | US | claimed |
| EP-3145723-A1 | LIQUID JET HEAD AND METHOD FOR PRODUCING SAME, AND LIQUID JET APPARATUS AND IMAGE FORMING APPARATUS | Ricoh Company, Ltd. (JP) | 2017-03-29 | — | — | EP | claimed |
| US-20170043580-A1 | LIQUID JET HEAD AND METHOD FOR PRODUCING SAME, AND LIQUID JET APPARATUS AND IMAGE FORMING APPARATUS | RICOH COMPANY, LTD. (JP) | 2017-02-16 | — | — | US | claimed |
| EP-2436715-B1 | EPOXY RESIN-BASED COATING COMPOSITION | SHOWA DENKO KK (JP) | 2016-08-24 | — | — | EP | claimed |
| WO-2015178010-A1 | LIQUID JET HEAD AND METHOD FOR PRODUCING SAME, AND LIQUID JET APPARATUS AND IMAGE FORMING APPARATUS | RICOH COMPANY, LTD. (JP) | 2015-11-26 | — | — | WO | claimed |
| US-8865801-B2 | Epoxy resin-based coating composition | SHOWA DENKO K.K. (JP) | 2014-10-21 | — | — | US | claimed |
| US-20120077903-A1 | EPOXY RESIN-BASED COATING COMPOSITION | SHOWA DENKO K.K. (JP) | 2012-03-29 | — | — | US | claimed |
| EP-4747320-A1 | THERMAL-AND UV-CURABLE (METH) ACRYLATE COMPOSITION | Henkel AG & Co. KGaA (DE) | 2026-05-27 | — | — | EP | disclosed |
| CN-122095275-A | Method for manufacturing wavelength conversion sheet | — | 2026-05-26 | — | — | CN | disclosed |
| US-12637544-B2 | UV curable silicone composition and cured product thereof | DUROPTIX MATERIALS KABUSHIKI KAISHA (JP) | 2026-05-26 | — | — | US | disclosed |
| US-20260139157-A1 | THERMAL-AND-UV-CURABLE (METH)ACRYLATE COMPOSITION | HENKEL AG & CO KGAA (DE) | 2026-05-21 | — | — | US | disclosed |
| US-20060041053-A1 | Color filter black matrix resist composition and carbon black dispersion composition used for the composition | SHOWA DENKO K.K. (JP) | 2006-02-23 | — | — | US | disclosed |
| US-20060036023-A1 | Color filter black matrix resist composition | SHOWA DENKO K.K. (JP) | 2006-02-16 | — | — | US | disclosed |
| US-20050153231-A1 | Thiol compound, photopolymerization initiator composition and photosensitive composition | SHOWA DENKO K.K. (JP) | 2005-07-14 | — | — | US | disclosed |
| WO-2004106431-A2 | CURABLE POLYMER COMPOUND | SHOWA DENKO K.K. (JP) | 2004-12-09 | — | — | WO | disclosed |