⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2603141 | 0.77 | GRIN2D (0.39) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL64973 | 0.70 | GPR3 (0.38) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL7145436 | 0.67 | GPR3 (0.37) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL1293248 | 0.62 | GPR3 (0.39) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL25287606 | 0.61 | CA1 (0.44) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL25292878 | 0.61 | CA1 (0.44) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL23430060 | 0.61 | CA1 (0.44) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL25301943 | 0.61 | CA1 (0.44) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL20570425 | 0.61 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL7567644 | 0.61 | CA1 (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5756850-A | ARGON FLUORIDE EXCIMER LASER LITHOGRAPHY WITH ACID GENERATING RESINS WITH SULFONIUM SALTS | NEC CORPORATION (JP) | 1998-05-26 | — | — | US | disclosed |
| US-5691111-A | SULFONIUM SALT, ACRYLATE ESTER POLYMER | NEC CORPORATION (JP) | 1997-11-25 | — | — | US | disclosed |
| US-5635332-A | MIXTURE WITH ULTRAVIOLET TRANSPARENT POLYMER HAVING GROUPS WHICH ARE UNSTABLE TO ACID | NEC CORPORATION (JP) | 1997-06-03 | — | — | US | disclosed |
| US-5585507-A | FINENESS PATTERNS | NEC CORPORATION (JP) | 1996-12-17 | — | — | US | disclosed |