Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.65 |
| ▸ | MAOA | P21397 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 4/20 | 0.41 |
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | THRB | P10828 | 2/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | USP2 | O75604 | 1/20 | 0.41 |
| ▸ | HPN | P05981 | 1/20 | 0.41 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.41 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.41 |
| ▸ | PDE4A | P27815 | 1/20 | 0.41 |
| ▸ | KDR | P35968 | 1/20 | 0.41 |
| ▸ | SIRT5 | Q9NXA8 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluorene SCHEMBL28714196 | 0.84 | MAOA (0.48) | MAOAMAPTTSHRHSD17B10ALDH1A1 | |
| 1-Naphthol SCHEMBL17456245 | 0.82 | CYP1A2 (0.47) | CYP1A2PNMTNPC1RAB9ACA1 | |
| Phenanthrene SCHEMBL21219119 | 0.81 | TSHR (0.57) | CYP1A2MAOAMAPTTSHRHSD17B10 | |
| 1-Naphthol SCHEMBL8748998 | 0.81 | CYP1A2 (0.81) | CYP1A2MAPTTSHRHSD17B10ALDH1A1 | |
| Fluorene SCHEMBL28466769 | 0.81 | MAOA (0.54) | CYP1A2MAOAMAPTTSHRHSD17B10 | |
| 1-Naphthol SCHEMBL10486461 | 0.81 | CYP1A2 (1.00) | CYP1A2MAPTTSHRHSD17B10ALDH1A1 | |
| 1-Naphthol SCHEMBL29767730 | 0.81 | CYP1A2 (1.00) | CYP1A2MAPTTSHRHSD17B10ALDH1A1 | |
| 1-Naphthol SCHEMBL273260 | 0.81 | CYP1A2 (1.00) | CYP1A2MAPTTSHRHSD17B10ALDH1A1 | |
| 1-Naphthol SCHEMBL3416 | 0.81 | CYP1A2 (1.00) | CYP1A2MAPTTSHRHSD17B10ALDH1A1 | |
| 1-Naphthol SCHEMBL3924043 | 0.79 | CYP1A2 (0.94) | CYP1A2MAPTTSHRHSD17B10ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118215702-A | Thermoplastic resin and optical lens comprising the same | 三菱瓦斯化学株式会社 | 2024-06-18 | — | — | CN | disclosed |
| CN-111458981-B | Hard mask composition for anti-reflection | OLAS有限公司 | 2024-02-02 | — | — | CN | disclosed |
| WO-2023162653-A1 | RESIST UNDERLAYER FILM FORMATION COMPOSITION | 日産化学株式会社 | 2023-08-31 | — | — | WO | disclosed |
| US-11650505-B2 | Resist underlayer film-forming composition containing novolac resin reacted with aromatic methylol compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-05-16 | — | — | US | disclosed |
| CN-104541205-B | Resist underlayer film forming composition containing novolac resin having polynuclear phenol | 日产化学工业株式会社 | 2019-07-05 | — | — | CN | disclosed |
| CN-104067175-B | Composition for forming resist underlayer film containing copolymer resin having heterocycle | 日产化学工业株式会社 | 2018-01-02 | — | — | CN | disclosed |
| US-9842943-B2 | Method for manufacturing semiconductor device | RENESAS ELECTRONICS CORPORATION (JP) | 2017-12-12 | — | — | US | disclosed |
| US-9804492-B2 | Method for forming multi-layer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-31 | — | — | US | disclosed |
| US-9785049-B2 | Method for forming multi-layer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-10 | — | — | US | disclosed |
| CN-104185816-B | Resist lower membrane formation composition containing the novolac resin containing Phenylindole | 日产化学工业株式会社 | 2017-09-29 | — | — | CN | disclosed |
| US-8722841-B2 | Carbazole novolak resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-05-13 | — | — | US | disclosed |
| US-8674052-B2 | Carbazole novolak resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-03-18 | — | — | US | disclosed |
| US-20130280913-A1 | COMPOSITION FOR FORMING A RESIST UNDERLAYER FILM INCLUDING HYDROXYL GROUP-CONTAINING CARBAZOLE NOVOLAC RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-10-24 | — | — | US | disclosed |
| EP-2650729-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING HYDROXYL GROUP-CONTAINING CARBAZOLE NOVOLAC RESIN | Nissan Chemical Industries, Ltd. (JP) | 2013-10-16 | — | — | EP | disclosed |
| CN-103229104-A | Composition for forming resist underlayer film containing hydroxyl group-containing carbazole novolac resin | NISSAN CHEMICAL IND LTD | 2013-07-31 | — | — | CN | disclosed |
| US-20130189533-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYETHER STRUCTURE-CONTAINING RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-07-25 | — | — | US | disclosed |
| US-20130122710-A1 | CARBAZOLE NOVOLAK RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-05-16 | — | — | US | disclosed |
| CN-102803324-A | Carbazole Novolak Resin | NISSAN CHEMICAL IND LTD | 2012-11-28 | — | — | CN | disclosed |
| EP-2444431-A1 | CARBAZOLE NOVOLAK RESIN | Nissan Chemical Industries, Ltd. (JP) | 2012-04-25 | — | — | EP | disclosed |
| US-20120077345-A1 | CARBAZOLE NOVOLAK RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-03-29 | — | — | US | disclosed |