SCHEMBL9788988

SCHEMBL9788988

CN([Si](C)(Cl)Cl)[Si](C)(Cl)Cl

nearest known ligand 0.42

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22287352 0.84 ALDH1A1 (0.36) ALDH1A1
SCHEMBL2709128 0.84 ALDH1A1 (0.36) ALDH1A1
SCHEMBL2099803 0.76
SCHEMBL10591553 0.67 ALDH1A1 (0.36) ALDH1A1
SCHEMBL22589614 0.67 ALDH1A1 (0.36) ALDH1A1
SCHEMBL303170 0.67
SCHEMBL22287317 0.67 ALDH1A1 (0.33) ALDH1A1
SCHEMBL29249300 0.65 ALDH1A1 (0.33) ALDH1A1
Trimethylammonium SCHEMBL27262441 0.64
SCHEMBL2100849 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025226985-A1 PASSIVATION OF POLYSILICON MATERIAL AND SELECTIVE DEPOSITION OF DIELECTRIC MATERIAL UTILIZING ALKYNES VERSUM MATERIALS US, LLC (US) 2025-10-30 WO claimed
WO-2025076009-A1 SELECTIVE DEPOSITION OF SILICON CONTAINING FILMS UTILIZING ORGANOAMINOPOLYSILOXANES AND ORGANOAMINOPOLYSILAZANES VERSUM MATERIALS US, LLC (US) 2025-04-10 WO claimed
US-20230183272-A1 COMPOSITIONS AND METHODS USING SAME FOR SILICON CONTAINING FILMS VERSUM MAT US LLC (US) 2023-06-15 US claimed
CN-113518834-A Compositions for silicon-containing films and methods of use thereof 弗萨姆材料美国有限责任公司 2021-10-19 CN claimed
US-20200247830-A1 Compositions And Methods Using Same for Silicon Containing Films VERSUM MATERIALS US, LLC (US) 2020-08-06 US claimed
US-20260130139-A1 LOW TEMPERATURE SI-CONTAINING FILMS DEPOSITED FROM CHLOROSILANE AND AMINOSILANE REACTIONS VERSUM MAT US LLC (US) 2026-05-07 US disclosed
WO-2025076009-A1 SELECTIVE DEPOSITION OF SILICON CONTAINING FILMS UTILIZING ORGANOAMINOPOLYSILOXANES AND ORGANOAMINOPOLYSILAZANES VERSUM MATERIALS US, LLC (US) 2025-04-10 WO disclosed
WO-2024081357-A1 LOW TEMPERATURE SI-CONTAINING FILMS DEPOSITED FROM CHLOROSILANE AND AMINOSILANE REACTIONS VERSUM MATERIALS US, LLC (US) 2024-04-18 WO disclosed
US-20230183272-A1 COMPOSITIONS AND METHODS USING SAME FOR SILICON CONTAINING FILMS VERSUM MAT US LLC (US) 2023-06-15 US disclosed
US-20230183272-A1 COMPOSITIONS AND METHODS USING SAME FOR SILICON CONTAINING FILMS VERSUM MAT US LLC (US) 2023-06-15 US disclosed
EP-3902938-A1 COMPOSITIONS AND METHODS USING SAME FOR SILICON CONTAINING FILMS Versum Materials US, LLC (US) 2021-11-03 EP disclosed
CN-113518834-A Compositions for silicon-containing films and methods of use thereof 弗萨姆材料美国有限责任公司 2021-10-19 CN disclosed
WO-2020160529-A1 COMPOSITIONS AND METHODS USING SAME FOR SILICON CONTAINING FILMS VERSUM MATERIALS US, LLC (US) 2020-08-06 WO disclosed
US-20200247830-A1 Compositions And Methods Using Same for Silicon Containing Films VERSUM MATERIALS US, LLC (US) 2020-08-06 US disclosed
US-5030702-A Polysilazanes, processes for their preparation, ceramic materials which contain silicon nitride and can be prepared from them, and preparation thereof HOECHST AKTIENGESELLSCHAFT (DE) 1991-07-09 US disclosed
US-4946920-A Polysilazanes, processes for their preparation, ceramic materials which contain silicon nitride and can be prepared from them, and preparation thereof HOECHST AKTIENGESELLSCHAFT (DE) 1990-08-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200247830-A1 Compositions And Methods Using Same for Silicon Containing Films SGMS1, SGMS2, SPTBN1 ALDH1A1 3040/4885
US-20230183272-A1 COMPOSITIONS AND METHODS USING SAME FOR SILICON CONTAINING FILMS SGMS1, SGMS2, SPTBN1 ALDH1A1 3040/4885
US-20260130139-A1 LOW TEMPERATURE SI-CONTAINING FILMS DEPOSITED FROM CHLOROSILANE AND AMINOSILANE REACTIONS AS3MT, SIK1, ADH1A ALDH1A1 221/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.