Sulfuric Acid

Sulfuric Acid

SCHEMBL8711853

CCCCCCCCCCCC1(N)CCO1.O=S(=O)(O)O

nearest known ligand 0.45

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Known targets — ChEMBL curated mechanism

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

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL787178 0.89
SCHEMBL5430828 0.89
Sulfuric Acid SCHEMBL8520466 0.78
Sulfuric Acid SCHEMBL2050148 0.78
Sulfuric Acid SCHEMBL16618109 0.78
Sulfuric Acid SCHEMBL408143 0.77
SCHEMBL547151 0.73 PRKCA (0.35)
SCHEMBL24892998 0.73 DNM1 (0.40)
SCHEMBL359071 0.73 DNM1 (0.40)
SCHEMBL10523286 0.73 DNM1 (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0883163-A2 Method of forming micropatterns MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD (JP) 1998-12-09 EP disclosed
US-5741628-A CHEMICAL AMPLIFICATION WHICH GENERATES AN ACID IN RESPONSE TO LASER RADIATION MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1998-04-21 US disclosed
US-5679500-A FORMING RESIST FILM BY USING A CHEMICAL AMPLIFICATION RESIST WHICH GENERATES AN ACID IN RESPONSE TO LASER LIGHT AND WHICH REACTS WITH THE ACID MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1997-10-21 US disclosed
US-5658711-A FORMING RESIST FILM CONTAINING BASE GENERATOR, GENERATING BASE BY RADIATION, FORMING METAL OXIDE FILM, ETCHING MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1997-08-19 US disclosed
EP-0691674-A2 Method of forming micropatterns MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1996-01-10 EP disclosed