⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19894261 | 0.77 | — | — | |
| SCHEMBL15757386 | 0.73 | — | — | |
| SCHEMBL2030789 | 0.70 | NFKB1 (0.30) | — | |
| SCHEMBL13714367 | 0.70 | LMNA (0.30) | — | |
| SCHEMBL3860101 | 0.69 | — | — | |
| SCHEMBL15711452 | 0.69 | — | — | |
| SCHEMBL6904964 | 0.69 | — | — | |
| SCHEMBL3682865 | 0.67 | — | — | |
| SCHEMBL6756473 | 0.67 | — | — | |
| SCHEMBL13007747 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10550287-B2 | Solvent-free silicone-modified polyimide resin composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-02-04 | — | — | US | disclosed |
| US-10421840-B2 | Silicone-modified polyimide resin composition of solvent free type | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-09-24 | — | — | US | disclosed |
| US-20180312723-A1 | SOLVENT-FREE SILICONE-MODIFIED POLYIMIDE RESIN COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-11-01 | — | — | US | disclosed |
| US-20170355825-A1 | SILICONE-MODIFIED POLYIMIDE RESIN COMPOSITION OF SOLVENT FREE TYPE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-14 | — | — | US | disclosed |
| CN-103168067-A | Water-processable silicone-containing prepolymers and uses thereof | NOVARTIS AG | 2013-06-19 | — | — | CN | disclosed |
| US-20120076948-A1 | METHOD FOR PRODUCING CURABLE COMPOSITION FOR IMPRINTS | FUJIFILM CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| CN-1556839-A | Cationic reactive dyes | 西巴特殊化学品控股有限公司 | 2004-12-22 | — | — | CN | disclosed |
| CN-1187827-A | Polymerizable siloxane macromonomers | CIBA GEIGY AG (CH) | 1998-07-15 | — | — | CN | disclosed |
| EP-0781777-A1 | Silicon-containing compound and ocular lens material | Menicon Co., Ltd. (JP) | 1997-07-02 | — | — | EP | disclosed |
| US-5556929-A | FROM UNSATURATED DIESTER WITH URETHANE AND FLUORINE GROUPS AND ACRYLATED SILOXANE, CONTACT LENSES | MENICON CO., LTD. (JP) | 1996-09-17 | — | — | US | disclosed |
| EP-0381005-A2 | Ocular lens material | Menicon Co., Ltd. (JP) | 1990-08-08 | — | — | EP | disclosed |
| EP-0379146-A2 | Soft ocular lens material | Menicon Co., Ltd. (JP) | 1990-07-25 | — | — | EP | disclosed |
| US-4892402-A | PHOTOPOLYMERIZATION SURFACE TREATMENT | HOYA CORPORATION (JP) | 1990-01-09 | — | — | US | disclosed |