SCHEMBL8714774

SCHEMBL8714774

CC1=C(C)C([Ti](C)(C)([SiH3])(Cl)(Cl)NC2CCCCCCCCCCC2)c2ccccc21

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BCHE P06276 1/20 0.40
ACHE P22303 1/20 0.40
TSHR P16473 3/20 0.32
HTT P42858 2/20 0.32
L3MBTL1 Q9Y468 2/20 0.32
KMT2A Q03164 3/20 0.31
LMNA P02545 2/20 0.31
MEN1 O00255 2/20 0.31
DUSP1 P28562 1/20 0.31
DUSP6 Q16828 1/20 0.31
TP53 P04637 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP3A4 P08684 1/20 0.31
CYP2D6 P10635 1/20 0.31
CYP2C9 P11712 1/20 0.31
CYP2C19 P33261 1/20 0.31
HIF1A Q16665 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
RECQL P46063 1/20 0.31
NPC1 O15118 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7630771 0.79 CYP2C19 (0.40) KMT2AMEN1CYP2C19ALDH1A1GAA
SCHEMBL7627311 0.69 P2RX7 (0.42) KMT2AMEN1TP53RECQLRAB9A
Hydrochloric Acid SCHEMBL8027143 0.67 BCHE (0.41) BCHEACHETSHRHTTL3MBTL1
SCHEMBL2033385 0.60 CYP2C19 (0.43) KMT2ALMNAMEN1CYP2C19ALDH1A1
SCHEMBL4651299 0.60 GPR3 (0.34) TDP1NPC1RAB9AGAA
SCHEMBL6673596 0.60 GPR3 (0.34) NPC1RAB9AGAA
Hydrochloric Acid SCHEMBL650587 0.59 ACHE (0.32) BCHEACHECYP1A2CYP2D6
Hydrochloric Acid SCHEMBL651332 0.59 ACHE (0.32) BCHEACHECYP1A2CYP2D6
SCHEMBL27602853 0.59 GPR3 (0.37) ACHEKMT2ALMNAMEN1
SCHEMBL27585043 0.57 GPR3 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0874860-A1 SUBSTITUTED INDENYL CONTAINING METAL COMPLEXES AND OLEFIN POLYMERIZATION PROCESS THE DOW CHEMICAL COMPANY (US) 1998-11-04 EP disclosed
WO-1997015583-A1 SUBSTITUTED INDENYL CONTAINING METAL COMPLEXES AND OLEFIN POLYMERIZATION PROCESS THE DOW CHEMICAL COMPANY (US) 1997-05-01 WO disclosed