SCHEMBL8719660

SCHEMBL8719660

CCCc1ccc(OC(C)OC)cc1

nearest known ligand 0.47

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
PPARG P37231 1/20 0.45
PPARA Q07869 1/20 0.45
THRB P10828 1/20 0.43
ACACB O00763 1/20 0.40
ACACA Q13085 1/20 0.40
LPL P06858 1/20 0.39
LIPG Q9Y5X9 1/20 0.39
TAAR1 Q96RJ0 1/20 0.39
ALDH1A1 P00352 1/20 0.39
SIGMAR1 Q99720 1/20 0.39
HTT P42858 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
FFAR1 O14842 1/20 0.38
POLB P06746 1/20 0.38
KMT2A Q03164 1/20 0.38
TAS1R3 Q7RTX0 1/20 0.38
TAS1R1 Q7RTX1 1/20 0.38
MAPT P10636 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29126912 0.86 PPARG (0.40) PPARGPPARATHRBACACBACACA
SCHEMBL2772836 0.85 PPARG (0.43) PPARGPPARATHRBACACBACACA
SCHEMBL13156094 0.83 PPARG (0.45) PPARGPPARAALDH1A1SMN1; SMN2POLB
SCHEMBL7903010 0.83 POLB (0.53) PPARGPPARATHRBACACBALDH1A1
SCHEMBL7101059 0.82 PPARG (0.41) PPARGPPARATHRBACACBACACA
SCHEMBL27729576 0.82 ACACB (0.50) PPARGPPARATHRBACACBACACA
SCHEMBL22042809 0.81 LTA4H (0.48) PPARGPPARAALDH1A1POLBMAPT
SCHEMBL15112941 0.80 CALM1 (0.39) PPARGPPARATAAR1ALDH1A1SIGMAR1
SCHEMBL4137878 0.80 PPARG (0.49) PPARGPPARATHRBACACBACACA
SCHEMBL19428100 0.78 PPARG (0.41) PPARGPPARATHRBACACBACACA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5780206-A USING AN ANTHRACENE DERIVATIVE AS AN ABSORBER ON HIGHLY REFLECTIVE SURFACES; ALKALI-SOLUBLE POLYMERS; GENERATION OF ACID CATALYSTS; FINE PATTERNS WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1998-07-14 US disclosed
US-5695910-A RESIN BECOMES ALKALI SOLUBLE BY ELIMINATING PROTECTIVE GROUPS BY ACTION OF IN SITU GENERATED ACID WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1997-12-09 US disclosed