Benzo[D]Thiazole

Benzo[D]Thiazole

SCHEMBL8723619

[PoH2].c1ccc2scnc2c1

nearest known ligand 0.95

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.95
HSD17B10 Q99714 3/20 0.95
NPC1 O15118 4/20 0.42
RAB9A P51151 4/20 0.42
KDM4E B2RXH2 3/20 0.42
TDP1 Q9NUW8 2/20 0.42
L3MBTL1 Q9Y468 2/20 0.42
HKDC1 Q2TB90 1/20 0.42
DYRK1A Q13627 2/20 0.40
IDO1 P14902 1/20 0.38
RIPK1 Q13546 1/20 0.36
MAPK14 Q16539 1/20 0.36
SYK P43405 1/20 0.36
SLC6A3 Q01959 2/20 0.35
ADRA2A P08913 1/20 0.35
FBP1 P09467 1/20 0.35
ADORA3 P0DMS8 1/20 0.35
DRD2 P14416 1/20 0.35
HPGD P15428 1/20 0.35
ALOX15 P16050 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzo[D]Thiazole SCHEMBL31388426 0.97
Benzo[D]Thiazole SCHEMBL451685 0.97
Benzo[D]Thiazole SCHEMBL10847268 0.97
Benzo[D]Thiazole SCHEMBL900814 0.97 ALDH1A1 (1.00) ALDH1A1HSD17B10NPC1RAB9AKDM4E
Benzo[D]Thiazole SCHEMBL8430 0.97
Benzo[D]Thiazole SCHEMBL49903 0.95 ALDH1A1 (0.95) ALDH1A1HSD17B10NPC1RAB9AKDM4E
Benzo[D]Thiazole SCHEMBL5141991 0.95 ALDH1A1 (0.95) ALDH1A1HSD17B10NPC1RAB9AKDM4E
Benzo[D]Thiazole SCHEMBL18549009 0.95 ALDH1A1 (0.95) ALDH1A1HSD17B10NPC1RAB9AKDM4E
Benzo[D]Thiazole SCHEMBL5141989 0.95 ALDH1A1 (0.95) ALDH1A1HSD17B10NPC1RAB9AKDM4E
Benzo[D]Thiazole SCHEMBL21679998 0.95 ALDH1A1 (0.95) ALDH1A1HSD17B10NPC1RAB9AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5780387-A RECORDING LAYER INCLUDES LOW MOLECULAR WEIGHT ORGANIC COMPOUND AND RESIN MATRIX; OVERCOAT LAYER HAVING PROTRUSIONS ON SURFACE RICOH COMPANY, LTD. (JP) 1998-07-14 US disclosed