Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 2/20 | 0.42 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 2/20 | 0.41 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.40 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.38 |
| ▸ | PKM | P14618 | 1/20 | 0.38 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4237394 | 0.98 | TP53 (0.42) | TP53MEN1KMT2ASMN1; SMN2MAPK1 | |
| Hydrochloric Acid SCHEMBL9343453 | 0.94 | MEN1 (0.46) | TP53MEN1KMT2ASMN1; SMN2MAPK1 | |
| SCHEMBL9120855 | 0.94 | TP53 (0.42) | TP53MEN1KMT2ASMN1; SMN2MAPK1 | |
| Water SCHEMBL9247303 | 0.90 | DNM1 (0.43) | TP53MEN1KMT2ASMN1; SMN2MAPK1 | |
| SCHEMBL8757335 | 0.90 | DNM1 (0.46) | TP53MEN1KMT2ASMN1; SMN2MAPK1 | |
| Bromide SCHEMBL8756273 | 0.88 | DNM1 (0.47) | TP53MEN1KMT2ASMN1; SMN2MAPK1 | |
| SCHEMBL4235702 | 0.85 | TP53 (0.46) | TP53SMN1; SMN2SIGMAR1DNM1TDP1 | |
| Hydrochloric Acid SCHEMBL7108463 | 0.80 | CYP1A2 (0.43) | TP53SMN1; SMN2MAPK1L3MBTL1 | |
| Hydrochloric Acid SCHEMBL392362 | 0.79 | ESR1 (0.58) | TP53 | |
| SCHEMBL11504622 | 0.78 | EPHX2 (0.37) | TP53MEN1KMT2ASMN1; SMN2MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0621313-B1 | Epoxy resin composition | MITSUI CHEMICALS INC (JP) | 1998-07-15 | — | — | EP | disclosed |
| US-5677397-A | Epoxy resin composition | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1997-10-14 | — | — | US | disclosed |
| EP-0621313-A2 | Epoxy resin composition | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1994-10-26 | — | — | EP | disclosed |
| EP-0293237-B1 | Epoxy compounds and epoxy resin compositions containing the same | MITSUI PETROCHEMICAL IND (JP) | 1994-07-27 | — | — | EP | disclosed |
| EP-0251431-B1 | EPOXY RESIN | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1993-07-28 | — | — | EP | disclosed |
| US-4954603-A | Epoxy resin | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1990-09-04 | — | — | US | disclosed |
| US-4900801-A | AROMATIC RINGS HAVING A TERTIARY ALKYL ORTHO TO THE GLYCIDYL RADICAL; CURED POLYMERS HAVING LOW DIELECTRIC CONSTANT; HEATTP RESISTANCE; FLEXIBILITY | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1990-02-13 | — | — | US | disclosed |
| US-4835240-A | Epoxy resin composition | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1989-05-30 | — | — | US | disclosed |
| EP-0294148-A2 | Epoxy resin composition | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1988-12-07 | — | — | EP | disclosed |
| EP-0293237-A2 | Epoxy compounds and epoxy resin compositions containing the same | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1988-11-30 | — | — | EP | disclosed |
| EP-0251431-A2 | Epoxy resin | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1988-01-07 | — | — | EP | disclosed |