Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MGLL | Q99685 | 11/20 | 0.46 |
| ▸ | FAAH | O00519 | 4/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.46 |
| ▸ | LMNA | P02545 | 2/20 | 0.46 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.46 |
| ▸ | BLM | P54132 | 2/20 | 0.46 |
| ▸ | GMNN | O75496 | 1/20 | 0.46 |
| ▸ | THPO | P40225 | 1/20 | 0.46 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.46 |
| ▸ | HPGD | P15428 | 2/20 | 0.44 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.44 |
| ▸ | TLR9 | Q9NR96 | 1/20 | 0.44 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | PKM | P14618 | 1/20 | 0.44 |
| ▸ | XBP1 | P17861 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | RECQL | P46063 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25423860 | 0.84 | MGLL (0.46) | MGLLFAAHALDH1A1LMNAMAPT | |
| SCHEMBL1264091 | 0.77 | MGLL (0.39) | MGLLFAAHALDH1A1LMNAMAPT | |
| SCHEMBL9640037 | 0.77 | MGLL (0.39) | MGLLFAAHALDH1A1LMNAMAPT | |
| SCHEMBL3482576 | 0.75 | MGLL (0.54) | MGLLFAAHALDH1A1LMNAMAPT | |
| SCHEMBL409863 | 0.74 | MGLL (0.52) | MGLLFAAHALDH1A1LMNAMAPT | |
| SCHEMBL22399174 | 0.74 | MGLL (0.52) | MGLLFAAHALDH1A1LMNAMAPT | |
| SCHEMBL17527855 | 0.73 | MGLL (0.37) | MGLLFAAHALDH1A1LMNAMAPT | |
| SCHEMBL11645947 | 0.73 | MGLL (0.37) | MGLLFAAHALDH1A1LMNAMAPT | |
| SCHEMBL9638974 | 0.73 | MGLL (0.37) | MGLLFAAHALDH1A1LMNAMAPT | |
| SCHEMBL17527854 | 0.72 | MGLL (0.35) | MGLLFAAHALDH1A1LMNAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117756987-B | Acrylic ester photoresist film-forming resin, arF photoresist and preparation method and application thereof | 福建泓光半导体材料有限公司 | 2025-01-24 | — | — | CN | disclosed |
| US-20250015349-A1 | POLYMER, METHOD FOR PRODUCING SAME, ELECTROLYTE COMPOSITION, AND BATTERY | KYOTO UNIVERSITY (JP) | 2025-01-09 | — | — | US | disclosed |
| EP-4438633-A1 | POLYMER, METHOD FOR PRODUCING SAME, ELECTROLYTE COMPOSITION, AND BATTERY | Sumitomo Chemical Company, Limited (JP) | 2024-10-02 | — | — | EP | disclosed |
| CN-117756987-A | Acrylic ester photoresist film-forming resin, arF photoresist and preparation method and application thereof | 福建泓光半导体材料有限公司 | 2024-03-26 | — | — | CN | disclosed |
| WO-2023095848-A1 | POLYMER, METHOD FOR PRODUCING SAME, ELECTROLYTE COMPOSITION, AND BATTERY | 住友化学株式会社 | 2023-06-01 | — | — | WO | disclosed |
| WO-2023095848-A1 | POLYMER, METHOD FOR PRODUCING SAME, ELECTROLYTE COMPOSITION, AND BATTERY | 住友化学株式会社 | 2023-06-01 | — | — | WO | disclosed |
| CN-115826360-A | Photosensitive polyimide composition, method for producing pattern, cured product, and electronic component | 江苏艾森半导体材料股份有限公司 | 2023-03-21 | — | — | CN | disclosed |
| CN-110941142-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2021-05-25 | — | — | CN | disclosed |
| CN-110941142-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2020-03-31 | — | — | CN | disclosed |
| CN-106104381-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2019-12-13 | — | — | CN | disclosed |
| US-7872716-B2 | Optical compensation film, polarizing plate and liquid crystal display | FUJIFILM CORPORATION (JP) | 2011-01-18 | — | — | US | disclosed |
| US-20080192191-A1 | Optical Compensation Film, Polarizing Plate and Liquid Crystal Display | FUJIFILM CORPORATION (JP) | 2008-08-14 | — | — | US | disclosed |
| EP-0722959-B1 | Highly oxygen-permeable heat-resistant material | MENICON CO LTD (JP) | 1998-04-08 | — | — | EP | disclosed |
| US-5587445-A | Highly oxygen-permeable heat-resistant material | MENICON CO., LTD. (JP) | 1996-12-24 | — | — | US | disclosed |
| EP-0722959-A2 | Highly oxygen-permeable heat-resistant material | Menicon Co., Ltd. (JP) | 1996-07-24 | — | — | EP | disclosed |
| US-5104428-A | N-substituted maleimide polymers; gas permeability, heat resistance, durability | TOSOH CORPORATION (JP) | 1992-04-14 | — | — | US | disclosed |
| EP-0466011-A1 | Separation membrane | Tosoh Corporation (JP) | 1992-01-15 | — | — | EP | disclosed |