Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | P2RX7 | Q99572 | 12/20 | 0.49 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.49 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
| ▸ | FOLH1 | Q04609 | 1/20 | 0.45 |
| ▸ | KDM5A | P29375 | 1/20 | 0.44 |
| ▸ | KDM5B | Q9UGL1 | 1/20 | 0.44 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4936872 | 0.86 | ALDH1A1 (0.47) | P2RX7MEN1KMT2A | |
| SCHEMBL27759391 | 0.83 | RARB (0.46) | P2RX7KDM4EMEN1KMT2AKDM5A | |
| SCHEMBL27780759 | 0.82 | KDM4E (0.47) | P2RX7KDM4EMEN1KMT2AKDM5A | |
| Phthalic Acid SCHEMBL28793332 | 0.76 | ALDH1A1 (0.70) | P2RX7KDM4E | |
| SCHEMBL14510877 | 0.76 | MEN1 (0.62) | P2RX7KDM4EMEN1KMT2A | |
| SCHEMBL27255420 | 0.74 | ALDH1A1 (0.50) | P2RX7KDM4EMEN1KMT2A | |
| SCHEMBL8381564 | 0.74 | P2RX7 (0.72) | P2RX7 | |
| SCHEMBL11446784 | 0.73 | P2RX7 (0.44) | P2RX7MEN1KMT2A | |
| SCHEMBL3175880 | 0.73 | P2RX7 (0.48) | P2RX7MEN1KMT2A | |
| SCHEMBL5475249 | 0.71 | KDM4E (0.53) | P2RX7KDM4EMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5633111-A | Photoresist composition and article containing 1,2-quinonediazide and an organic phosphorous acid compound | FUJI PHOTO FILM CO., LTD. (JP) | 1997-05-27 | — | — | US | disclosed |
| EP-0540032-B1 | Photoresist composition and etching method | FUJI PHOTO FILM CO LTD (JP) | 1996-03-06 | — | — | EP | disclosed |
| EP-0540032-A1 | Photoresist composition and etching method | FUJI PHOTO FILM CO., LTD. (JP) | 1993-05-05 | — | — | EP | disclosed |