SCHEMBL8740885

SCHEMBL8740885

O=S(=O)(c1ccc(OC2CCCCO2)cc1)c1ccc(OC2CCCCO2)cc1

nearest known ligand 0.56

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
PKM P14618 3/20 0.44
LMNA P02545 3/20 0.44
ALDH1A1 P00352 2/20 0.44
GAA P10253 1/20 0.44
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
CXCR4 P61073 1/20 0.40
TNK2 Q07912 3/20 0.38
HSD11B1 P28845 1/20 0.38
CHRM2 P08172 3/20 0.37
CHRM1 P11229 3/20 0.37
CHRM4 P08173 2/20 0.37
CHRM3 P20309 2/20 0.37
HTT P42858 1/20 0.36
DHFR P00374 1/20 0.36
HPGD P15428 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
ELANE P08246 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15731437 0.88 TNK2 (0.39) PKMLMNAALDH1A1MEN1KMT2A
SCHEMBL23208275 0.88 MEN1 (0.41) PKMLMNAALDH1A1GAAMEN1
SCHEMBL3500438 0.86 TNK2 (0.44) LMNAALDH1A1MEN1KMT2ATNK2
SCHEMBL8358540 0.81 MEN1 (0.37) PKMLMNAALDH1A1MEN1KMT2A
SCHEMBL25121933 0.79 TNK2 (0.38) LMNAALDH1A1MEN1KMT2ATNK2
SCHEMBL27344459 0.79 TNK2 (0.38) LMNAALDH1A1MEN1KMT2ACXCR4
SCHEMBL1457107 0.79 NPY1R (0.43) LMNAALDH1A1MEN1KMT2ATNK2
SCHEMBL8317953 0.79 LMNA (0.37) LMNAALDH1A1MEN1KMT2ATNK2
SCHEMBL4095108 0.78 HTT (0.44) LMNAGAAMEN1KMT2AHTT
SCHEMBL16021495 0.78 HTT (0.44) LMNAGAAMEN1KMT2AHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5700620-A POSITIVE PHOTORESIST HAVING HIGH RESOLUTION AND SMALL FILM THICKNESS DEPENDENCE FUJI PHOTO FILM CO., LTD. (JP) 1997-12-23 US disclosed
US-5609982-A Positive-working photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1997-03-11 US disclosed
EP-0658807-A1 Positive-working photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1995-06-21 EP disclosed