Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TNK2 | Q07912 | 3/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 3/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | KDM4C | Q9H3R0 | 1/20 | 0.36 |
| ▸ | DHFR | P00374 | 1/20 | 0.36 |
| ▸ | ACP1 | P24666 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.32 |
| ▸ | CXCR4 | P61073 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25121933 | 0.86 | TNK2 (0.38) | TNK2MEN1KMT2ALMNAHTT | |
| SCHEMBL739210 | 0.83 | DHFR (0.45) | TNK2MEN1KMT2AKDM4CDHFR | |
| SCHEMBL3500438 | 0.81 | TNK2 (0.44) | TNK2MEN1KMT2ALMNAKDM4C | |
| SCHEMBL8317953 | 0.79 | LMNA (0.37) | TNK2MEN1KMT2ALMNAHTT | |
| SCHEMBL8740885 | 0.79 | PKM (0.44) | TNK2MEN1KMT2ALMNAHTT | |
| SCHEMBL7157475 | 0.78 | HRH1 (0.41) | TNK2MEN1KMT2ALMNAHTT | |
| SCHEMBL13131087 | 0.78 | MEN1 (0.39) | TNK2MEN1KMT2AKDM4CDHFR | |
| SCHEMBL674989 | 0.77 | TNK2 (0.40) | TNK2MEN1KMT2ALMNAKDM4C | |
| SCHEMBL24996347 | 0.77 | MEN1 (0.41) | TNK2MEN1KMT2AKDM4CDHFR | |
| SCHEMBL13131043 | 0.77 | MEN1 (0.39) | TNK2MEN1KMT2AKDM4CDHFR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024143131-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ONIUM SALT | 富士フイルム株式会社 | 2024-07-04 | — | — | WO | disclosed |