SCHEMBL8744249

SCHEMBL8744249

Cc1c([N+](=O)[O-])ccc(CO)c1[N+](=O)[O-]

nearest known ligand 0.47

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.47
TSHR P16473 7/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
CYP3A4 P08684 1/20 0.40
ALDH1A1 P00352 4/20 0.38
GPR35 Q9HC97 1/20 0.38
HSD17B10 Q99714 1/20 0.37
CTSB P07858 1/20 0.37
TXNRD1 Q16881 1/20 0.37
TXNRD3 Q86VQ6 1/20 0.37
TXNRD2 Q9NNW7 1/20 0.37
CA12 O43570 1/20 0.36
MAPT P10636 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28827965 0.85 TDP1 (0.50) TDP1TSHRSMN1; SMN2CYP3A4ALDH1A1
SCHEMBL29559430 0.84 ALDH1A1 (0.44) TDP1TSHRSMN1; SMN2CYP3A4ALDH1A1
SCHEMBL22898043 0.84 ALDH1A1 (0.44) TDP1TSHRSMN1; SMN2CYP3A4ALDH1A1
SCHEMBL27831403 0.82 TDP1 (0.38) TDP1TSHRSMN1; SMN2ALDH1A1GPR35
SCHEMBL8439887 0.80 S100A4 (0.43) TDP1TSHRCYP3A4ALDH1A1GPR35
SCHEMBL28791582 0.80 TSHR (0.39) TDP1TSHRSMN1; SMN2CYP3A4ALDH1A1
SCHEMBL14092108 0.79 GPR35 (0.47) TDP1TSHRSMN1; SMN2CYP3A4ALDH1A1
SCHEMBL28240034 0.79 TDP1 (0.48) TDP1TSHRSMN1; SMN2ALDH1A1GPR35
SCHEMBL28156049 0.79 TDP1 (0.39) TDP1TSHRSMN1; SMN2CYP3A4ALDH1A1
SCHEMBL7520585 0.78 TDP1 (0.60) TDP1TSHRSMN1; SMN2CYP3A4ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0155231-B2 Image-producing process CIBA GEIGY AG (CH) 1997-01-15 EP disclosed
US-5508141-A AQUEOUS ACIDIC PHOTORESIST EMULSION CONTAINING RESIN, POSITIVE-ACTING PHOTOACTIVE FUNCTIONALITY, ACID, OXIDIZING AGENT, SURFACTANT W. R. GRACE & CO.-CONN. (US) 1996-04-16 US disclosed
EP-0468002-A4 AUTODEPOSITION EMULSION FOR SELECTIVELY PROTECTING METALLIC SURFACES GRACE W R & CO (US) 1995-08-09 EP disclosed
US-5232815-A Corrosion resistance W. R. GRACE & CO.-CONN. (US) 1993-08-03 US disclosed
EP-0518453-A1 A method of making electrical circuit traces W.R. Grace & Co.-Conn. (US) 1992-12-16 EP disclosed
EP-0468002-A1 AUTODEPOSITION EMULSION FOR SELECTIVELY PROTECTING METALLIC SURFACES W.R. GRACE & CO.-CONN. (US) 1992-01-29 EP disclosed
WO-1991008840-A1 AUTODEPOSITION EMULSION FOR SELECTIVELY PROTECTING METALLIC SURFACES W.R. GRACE & CO.-CONN. (US) 1991-06-27 WO disclosed
US-4808682-A BLEND WITH OLEFINICALLY UNSATURATED SILICON COMPOUND BASF AKTIENGESELLSCHAFT (DE) 1989-02-28 US disclosed
US-4632900-A Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface CIBA-GEIGY CORPORATION (US) 1986-12-30 US disclosed
EP-0155231-A2 Image-producing process CIBA-GEIGY AG (CH) 1985-09-18 EP disclosed