SCHEMBL8750396

SCHEMBL8750396

CCCC(Cc1ccc(C)cc1)OC(CCC)Cc1ccc(C)cc1

nearest known ligand 0.38

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.38
ESR2 Q92731 1/20 0.38
AGXT P21549 2/20 0.38
CTSK P43235 2/20 0.37
IDO1 P14902 1/20 0.37
BDKRB2 P30411 1/20 0.36
CA12 O43570 1/20 0.35
CA2 P00918 1/20 0.35
CA9 Q16790 1/20 0.35
CYP1A2 P05177 1/20 0.34
CYP2A6 P11509 1/20 0.34
TAAR1 Q96RJ0 1/20 0.34
PPARG P37231 1/20 0.34
PPARA Q07869 1/20 0.34
NR3C1 P04150 1/20 0.33
PGR P06401 1/20 0.33
NR3C2 P08235 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8750431 0.86 TAS1R3 (0.40) ESR1ESR2CTSKBDKRB2CYP2A6
SCHEMBL8750366 0.83 AGXT (0.40) ESR1ESR2AGXTIDO1CA2
SCHEMBL8750563 0.82 CTSK (0.50) CTSKCYP2A6TAAR1
SCHEMBL8750438 0.79 TAS1R3 (0.36) ESR1ESR2CTSKBDKRB2PPARG
SCHEMBL13430495 0.75 AGXT (0.40) AGXTIDO1CA2CA9CYP1A2
SCHEMBL1050885 0.73 ESR1 (0.43) ESR1ESR2IDO1CA12CA2
SCHEMBL14402493 0.73 ESR1 (0.43) ESR1ESR2IDO1CA12CA2
SCHEMBL16067483 0.72 CTSK (0.43) CTSKCYP1A2PPARGPPARA
SCHEMBL1053020 0.72 ESR1 (0.42) ESR1ESR2IDO1CA12CA2
SCHEMBL4953348 0.72 CTSK (0.51) CTSKCYP2A6TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0523697-B1 Color-developing compositions and their use MITSUI TOATSU CHEMICALS (JP) 1997-04-02 EP disclosed
US-5447901-A Color-developing sheet: base material coated with composition of /a/ multivalent metal-modified salicylic acid resin formed from salicylic acid, a benzyl compound and optional styrene and /b/ analogous resin free of salicylic acid MITSUI TOATSU CHEMICAL, INC. (JP) 1995-09-05 US disclosed
US-5376615-A Pressure sensitive elements containing a salicylic acid resin and a phenolic resin MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1994-12-27 US disclosed
EP-0523697-A1 Color-developing compositions and their use MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-01-20 EP disclosed