SCHEMBL8750431

SCHEMBL8750431

CCCC(Cc1ccc(CC)cc1)OC(CCC)Cc1ccc(CC)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAS1R3 Q7RTX0 1/20 0.40
TAS1R1 Q7RTX1 1/20 0.40
ESR1 P03372 1/20 0.39
ESR2 Q92731 1/20 0.39
CTSK P43235 2/20 0.38
BDKRB2 P30411 1/20 0.37
PPARG P37231 1/20 0.37
PPARA Q07869 1/20 0.37
TSHR P16473 1/20 0.36
MAPK1 P28482 1/20 0.36
ATM Q13315 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
TP53 P04637 1/20 0.36
TAAR1 Q96RJ0 1/20 0.35
CYP2A6 P11509 1/20 0.34
LPL P06858 1/20 0.34
LIPG Q9Y5X9 1/20 0.34
PRKCA P17252 1/20 0.33
PRKCD Q05655 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8750396 0.86 ESR1 (0.38) ESR1ESR2CTSKBDKRB2PPARG
SCHEMBL8750563 0.83 CTSK (0.50) CTSKTP53TAAR1CYP2A6
SCHEMBL8750438 0.77 TAS1R3 (0.36) TAS1R3TAS1R1ESR1ESR2CTSK
SCHEMBL4953348 0.73 CTSK (0.51) CTSKTAAR1CYP2A6
SCHEMBL8750468 0.72 TAS1R3 (0.38) TAS1R3TAS1R1CTSKPPARGPPARA
SCHEMBL10783170 0.72 CTSK (0.48) CTSKTAAR1CYP2A6
SCHEMBL676400 0.71 FOS (0.62) TSHRMAPK1ATMTDP1TAAR1
SCHEMBL21402299 0.71 ALOX15 (0.62) TSHR
SCHEMBL2726278 0.71 CYP1A2 (0.45) CTSKTAAR1
SCHEMBL9233306 0.71 CSNK1E (0.53) CTSK

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0523697-B1 Color-developing compositions and their use MITSUI TOATSU CHEMICALS (JP) 1997-04-02 EP disclosed
US-5447901-A Color-developing sheet: base material coated with composition of /a/ multivalent metal-modified salicylic acid resin formed from salicylic acid, a benzyl compound and optional styrene and /b/ analogous resin free of salicylic acid MITSUI TOATSU CHEMICAL, INC. (JP) 1995-09-05 US disclosed
US-5376615-A Pressure sensitive elements containing a salicylic acid resin and a phenolic resin MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1994-12-27 US disclosed
EP-0523697-A1 Color-developing compositions and their use MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-01-20 EP disclosed