Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 4/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | GAA | P10253 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | APEX1 | P27695 | 1/20 | 0.42 |
| ▸ | RECQL | P46063 | 1/20 | 0.42 |
| ▸ | BLM | P54132 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | TTR | P02766 | 1/20 | 0.41 |
| ▸ | TP53 | P04637 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | ACHE | P22303 | 1/20 | 0.41 |
| ▸ | BACE1 | P56817 | 1/20 | 0.41 |
| ▸ | PDGFRB | P09619 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15495695 | 0.80 | MTNR1A (0.31) | KDM4EMAPTKMT2ATDP1MEN1 | |
| SCHEMBL8711726 | 0.78 | CYP1A2 (0.45) | CYP3A4KDM4EKMT2AGAAALDH1A1 | |
| SCHEMBL5372977 | 0.75 | KMT2A (0.43) | KDM4EMAPTKMT2AALDH1A1TDP1 | |
| SCHEMBL2516967 | 0.74 | ALDH1A1 (0.47) | CYP3A4KDM4EMAPTKMT2AGAA | |
| SCHEMBL21625025 | 0.73 | TP53 (0.41) | LMNACYP3A4KDM4EMAPTGAA | |
| SCHEMBL18499938 | 0.73 | MAPT (0.44) | LMNACYP3A4KDM4EMAPTKMT2A | |
| SCHEMBL8766190 | 0.71 | CA12 (0.46) | LMNACYP3A4KDM4EMAPTKMT2A | |
| SCHEMBL23722664 | 0.70 | LTA4H (0.41) | LMNACYP3A4KDM4EKMT2AALDH1A1 | |
| SCHEMBL15495689 | 0.70 | ALDH1A1 (0.41) | KDM4EMAPTKMT2AGAAALDH1A1 | |
| SCHEMBL30155392 | 0.70 | KMT2A (0.61) | LMNACYP3A4KDM4EMAPTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10023752-B2 | Conductive material and substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-07-17 | — | — | US | disclosed |
| US-10020089-B2 | Conductive polymer composite and substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-07-10 | — | — | US | disclosed |
| US-9991019-B2 | Conductive polymer composite and substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-05 | — | — | US | disclosed |
| US-20180134860-A1 | STRETCHABLE FILM, METHOD FOR FORMING THE SAME, STRETCHABLE WIRING FILM, AND METHOD FOR MANUFACTURING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-17 | — | — | US | disclosed |
| US-9922747-B2 | Conductive material and substrate | SHIN-ETSU HANDOTAI CO., LTD. (JP) | 2018-03-20 | — | — | US | disclosed |
| US-9916916-B2 | Conductive material and substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-13 | — | — | US | disclosed |
| US-9897917-B2 | Conductive polymer composition, coated article, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-20 | — | — | US | disclosed |
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9788422-B2 | Conductive material and substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-10 | — | — | US | disclosed |
| US-20150030983-A1 | RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2015-01-29 | — | — | US | disclosed |
| US-20150030983-A1 | RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2015-01-29 | — | — | US | disclosed |
| US-20140178818-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-26 | — | — | US | disclosed |
| US-20140178818-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-26 | — | — | US | disclosed |
| US-20140178820-A1 | RESIST COMPOSITION, PATTERNING PROCESS AND POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-26 | — | — | US | disclosed |
| US-20140178820-A1 | RESIST COMPOSITION, PATTERNING PROCESS AND POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-26 | — | — | US | disclosed |
| US-20140065544-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-06 | — | — | US | disclosed |
| US-20140065544-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-06 | — | — | US | disclosed |
| EP-0505972-B1 | Process for producing styrenic copolymer | IDEMITSU KOSAN CO (JP) | 1997-06-11 | — | — | EP | disclosed |
| EP-0505972-A2 | Process for producing styrenic copolymer | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-09-30 | — | — | EP | disclosed |