Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.52 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.45 |
| ▸ | TSHR | P16473 | 2/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.45 |
| ▸ | TGM2 | P21980 | 4/20 | 0.38 |
| ▸ | GAA | P10253 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.36 |
| ▸ | MAPT | P10636 | 3/20 | 0.35 |
| ▸ | HTT | P42858 | 3/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | EGFR | P00533 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | RAD52 | P43351 | 1/20 | 0.31 |
| ▸ | RECQL | P46063 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1082806 | 0.88 | ZDHHC20 (0.45) | ZDHHC20ZDHHC2ALDH1A1TSHRMAPK1 | |
| SCHEMBL29914674 | 0.85 | ZDHHC20 (0.49) | ZDHHC20ZDHHC2ALDH1A1TSHRMAPK1 | |
| SCHEMBL1072097 | 0.85 | ZDHHC20 (0.68) | ZDHHC20ZDHHC2ALDH1A1TSHRMAPK1 | |
| SCHEMBL3279433 | 0.85 | ZDHHC20 (0.62) | ZDHHC20ZDHHC2ALDH1A1TSHRMAPK1 | |
| SCHEMBL3278217 | 0.84 | ZDHHC20 (0.71) | ZDHHC20ZDHHC2ALDH1A1TSHRMAPK1 | |
| SCHEMBL1274953 | 0.83 | ZDHHC20 (0.50) | ZDHHC20ZDHHC2ALDH1A1TSHRMAPK1 | |
| SCHEMBL109564 | 0.83 | ALDH1A1 (0.65) | ZDHHC20ZDHHC2ALDH1A1TSHRMAPK1 | |
| SCHEMBL4974265 | 0.82 | ZDHHC20 (0.64) | ZDHHC20ZDHHC2ALDH1A1TSHRMAPK1 | |
| SCHEMBL2832067 | 0.82 | ZDHHC20 (0.74) | ZDHHC20ZDHHC2ALDH1A1TSHRMAPK1 | |
| SCHEMBL2831579 | 0.82 | ZDHHC20 (0.74) | ZDHHC20ZDHHC2ALDH1A1TSHRMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2960314-B1 | POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE | FUJIMI INC (JP) | 2024-06-26 | — | — | EP | disclosed |
| US-11897081-B2 | Method for polishing silicon substrate and polishing composition set | FUJIMI INCORPORATED (JP) | 2024-02-13 | — | — | US | disclosed |
| EP-3159915-B1 | METHOD FOR POLISHING SILICON WAFER, POLISHING COMPOSITION, AND POLISHING COMPOSITION SET | FUJIMI INC (JP) | 2023-12-06 | — | — | EP | disclosed |
| CN-106463386-B | Method for polishing silicon wafer, polishing composition, and polishing composition set | 福吉米株式会社 | 2020-12-01 | — | — | CN | disclosed |
| EP-2957613-B1 | POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE | FUJIMI INC (JP) | 2020-11-18 | — | — | EP | disclosed |
| US-10745588-B2 | Silicon wafer polishing composition | FUJIMI INCORPORATED (JP) | 2020-08-18 | — | — | US | disclosed |
| EP-3007213-B1 | USE OF A COMPOSITION FOR SILICON WAFER POLISHING | FUJIMI INC (JP) | 2020-03-18 | — | — | EP | disclosed |
| US-20170253767-A1 | SILICON WAFER POLISHING COMPOSITION | FUJIMI INCORPORATED (JP) | 2017-09-07 | — | — | US | disclosed |
| EP-3159915-A1 | METHOD FOR POLISHING SILICON WAFER, POLISHING COMPOSITION, AND POLISHING COMPOSITION SET | Fujimi Incorporated (JP) | 2017-04-26 | — | — | EP | disclosed |
| US-9566685-B2 | Polishing composition and method for producing polished article | FUJIMI INCORPORATED (JP) | 2017-02-14 | — | — | US | disclosed |
| US-20160001416-A1 | POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE | FUJIMI INCORPORATED (JP) | 2016-01-07 | — | — | US | disclosed |
| US-20150376464-A1 | POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE | FUJIMI INCORPORATED (JP) | 2015-12-31 | — | — | US | disclosed |
| EP-2960314-A1 | POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE | Fujimi Incorporated (JP) | 2015-12-30 | — | — | EP | disclosed |
| EP-2957613-A1 | POLISHING COMPOSITION, PRODUCTION METHOD FOR POLISHING COMPOSITION, AND PRODUCTION METHOD FOR POLISHED ARTICLE | Fujimi Incorporated (JP) | 2015-12-23 | — | — | EP | disclosed |
| EP-0505972-B1 | Process for producing styrenic copolymer | IDEMITSU KOSAN CO (JP) | 1997-06-11 | — | — | EP | disclosed |
| EP-0490269-B1 | Graft copolymer and process for producing the same | IDEMITSU KOSAN CO (JP) | 1996-02-28 | — | — | EP | disclosed |
| US-5250629-A | Graft polymerization of styrene and ethylenically unsaturated monomer using transition metal catalysts, organoaluminum compounds; films, packaging, automobile parts | IDEMITSU KOSAN CO., LTD. (JP) | 1993-10-05 | — | — | US | disclosed |
| EP-0505972-A2 | Process for producing styrenic copolymer | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-09-30 | — | — | EP | disclosed |
| EP-0490269-A1 | Graft copolymer and process for producing the same | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-06-17 | — | — | EP | disclosed |
| US-3957710-A | Paper coating compositions from polymers of olefinically unsaturated monomers | BASF AKTIENGESELLSCHAFT (DT) | 1976-05-18 | — | — | US | disclosed |