SCHEMBL8766892

SCHEMBL8766892

O=S(=O)(CC1CO1)CC1CO1

nearest known ligand 0.42

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.42
HBB P68871 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
ALDH1A1 P00352 2/20 0.38
TDP1 Q9NUW8 1/20 0.38
LMNA P02545 2/20 0.33
GAA P10253 1/20 0.33
PKM P14618 1/20 0.33
MMP1 P03956 1/20 0.32
MMP2 P08253 1/20 0.32
TSHR P16473 1/20 0.31
CHRM2 P08172 2/20 0.30
CHRM5 P08912 2/20 0.30
CHRM3 P20309 2/20 0.30
CHRM4 P08173 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11348513 0.78 ALDH1A1 (0.38) TP53HBBSMN1; SMN2ALDH1A1TDP1
SCHEMBL9355200 0.77
SCHEMBL8093071 0.77
SCHEMBL10732472 0.77
Ammonia Solution, Strong SCHEMBL12274377 0.75
Potassium Ion SCHEMBL11568418 0.75
SCHEMBL6440603 0.75
SCHEMBL6440600 0.75
SCHEMBL14351585 0.71 CHRM2 (0.31) CHRM2CHRM5CHRM3CHRM4
SCHEMBL12451456 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240363902-A1 Electrolyte Additives that Reduce Gas Evolution in Li ion Batteries StoreDot Ltd. (IL) 2024-10-31 US claimed
CN-116438244-A Crosslinkable organosiloxane modified reactive resins 瓦克化学股份公司 2023-07-14 CN disclosed
EP-0589329-B1 Antistatic film bases and photographic elements comprising said antistatic film bases MINNESOTA MINING & MFG (US) 1997-08-13 EP disclosed
EP-0745896-A1 Antistatic film bases and photographic elements comprising said antistatic film bases MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1996-12-04 EP disclosed
US-5484693-A ELECTROCONDUCTIVE CROSSLINKED POLYMERS WITH STYRENESULFONIC ACID AND MALEIC ACID WITH EPOXIDE MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1996-01-16 US disclosed
EP-0589329-A1 Antistatic film bases and photographic elements comprising said antistatic filmbases MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1994-03-30 EP disclosed
US-5238706-A Photographic substrate coated with antistatic agent and crosslinking agent is rolled and heated to cure MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1993-08-24 US disclosed
EP-0486982-A1 Antistatic film bases and photographic elements comprising said antistatic film bases MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1992-05-27 EP disclosed