Potassium Ion

Potassium Ion

SCHEMBL11568418

O=S(=O)([O-])CC1CO1.[K+]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA

The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6440600 0.95
SCHEMBL8766892 0.75 TP53 (0.42)
SCHEMBL9355200 0.70
SCHEMBL8093071 0.70
SCHEMBL10732472 0.70
SCHEMBL23829528 0.68
SCHEMBL6440603 0.68
Ammonia Solution, Strong SCHEMBL12274377 0.68
SCHEMBL27985468 0.68
Ammonia Solution, Strong SCHEMBL27561172 0.68 INPP5A (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114644762-B Multiple modified lignin sulfonate dye dispersant and preparation method thereof 大连工业大学 2023-07-14 CN disclosed
EP-2508516-B1 COMPOSITION CONTAINING INTERMEDIATE FOR WATER-SOLUBLE MONOMER AND PROCESS FOR PRODUCTION THEREOF, COMPOSITION CONTAINING WATER-SOLUBLE MONOMER, INTERMEDIATE FOR WATER-SOLUBLE MONOMER, AND WATER-SOLUBLE MONOMER AND PROCESS FOR PRODUCTION THEREOF NIPPON CATALYTIC CHEM IND (JP) 2019-03-20 EP disclosed
US-8921584-B2 Composition containing intermediate for water-soluble monomer and process for production thereof, composition containing water-soluble monomer, intermediate for water-soluble monomer, and water-soluble monomer and process for production thereof NIPPON SHOKUBAI CO, LTD (JP) 2014-12-30 US disclosed
EP-2508516-A1 COMPOSITION CONTAINING INTERMEDIATE FOR WATER-SOLUBLE MONOMER AND PROCESS FOR PRODUCTION THEREOF, COMPOSITION CONTAINING WATER-SOLUBLE MONOMER, INTERMEDIATE FOR WATER-SOLUBLE MONOMER, AND WATER-SOLUBLE MONOMER AND PROCESS FOR PRODUCTION THEREOF Nippon Shokubai Co., Ltd. (JP) 2012-10-10 EP disclosed
US-20120238717-A1 COMPOSITION CONTAINING INTERMEDIATE FOR WATER-SOLUBLE MONOMER AND PROCESS FOR PRODUCTION THEREOF, COMPOSITION CONTAINING WATER-SOLUBLE MONOMER, INTERMEDIATE FOR WATER-SOLUBLE MONOMER, AND WATER-SOLUBLE MONOMER AND PROCESS FOR PRODUCTION THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2012-09-20 US disclosed
EP-0001811-A1 N-sulfohydroxyalkane-aminoalkanephosphonic acids and their salts, process for their preparation and their use as complex-forming agent Benckiser-Knapsack GmbH (DE) 1979-05-16 EP disclosed